Filtration on block copolymer solution used in directed self assembly lithography

Umeda, Toru; Takakura, Tomoyuki; Tsuzuki, Shuichi

doi:10.1117/12.2219423

Cited by 1 publication

(1 citation statement)

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“…We have investigated PS-b-PMMA block copolymer (BCP) filtration in terms of its impact on the polymer characteristics and gel/metal reduction [3][4][5][6], because BCPs employed in DSAL are considerably different from conventional chemically amplified resists (CAR). We have found the filtration using Nylon 6,6 filter is the most effective among other membrane materials for reducing gels, which is probably derived from insufficient solubility of substantially large molecular weight of the BCPs.…”

Section: Introductionmentioning

confidence: 99%

Neutral Layer Material Filtration for Directed Self Assembly Lithography

Umeda

Matsumiya

Yamano

et al. 2016

J. Photopol. Sci. Technol.

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Besides block copolymer, gel defects in neutral layer is another concern in directed self assembly lithography. To find appropriate filtration, we studied gel reduction in neutral layer materials. The test includes coating defectivity evaluation and gel removal test using various materials of filter membrane and neutral layer materials varied in monomer proportion of the polystyrene-random-poly(methyl methacrylate) (PS-r-PMMA) copolymer. Practical results using real world fluids and filters are obtained on the basis of collaboration. As a result, for intermediate PS content materials, Nylon 6,6 5 nm filter is found to be appropriate for gel reduction based on both coating defectivity and gel removal testing results. For relatively high PS content material, both Nylon 6,6 5 nm and HDPE 2 nm are recommended also based on the results. The mechanism of the gel removal is schemed based on hydrophilic interaction between Nylon 6,6 and hydrophilic part of the polymer.

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Section: Introductionmentioning

confidence: 99%