2015 IEEE 61st Holm Conference on Electrical Contacts (Holm) 2015
DOI: 10.1109/holm.2015.7355108
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Finite element modeling of nickel oxide film for Au-Ni contact of MEMS switches

Abstract: Abstract-Contamination and oxidation are inevitable in contact surfaces, especially for micro contact under low load (μN-mN). They are considered as major causes for a high contact resistance, and can lead to the failure of a contact. However, as the film formation is complicated, also it is difficult to accurately observe and measure them, the characterization of the films is not well known. In the paper, a finite element model of nickel oxide film is developed for Au-Ni contact of MEMS switches. Considering … Show more

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Cited by 3 publications
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“…In [51,60,61], Liu et al studied contact resistance using an asperity-based finite element model. They acquired AFMs of samples of several different contact materials including Au, Ru, and Au-Ni.…”
Section: Hertzian and Multiscale Models For Analyzing Mems Contact Re...mentioning
confidence: 99%
“…In [51,60,61], Liu et al studied contact resistance using an asperity-based finite element model. They acquired AFMs of samples of several different contact materials including Au, Ru, and Au-Ni.…”
Section: Hertzian and Multiscale Models For Analyzing Mems Contact Re...mentioning
confidence: 99%