2004
DOI: 10.1103/physrevb.69.155329
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First-principles exploration of alternative gate dielectrics: Electronic structure ofZrO2/SiandZrSi

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Cited by 116 publications
(60 citation statements)
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“…The significant underestimation of the band gap of SnO 2 is mainly due to the exchange contribution to the exchange-correlation potential, as it can be overcome by hybrid functional calculations. 30 Although the band gaps are underestimated, we have verified (using the approach of Van de Walle and Martin 31 and Puthenkovilakam et al 32 ) that the type of band alignment at the interface between SnO and SnO 2 agrees with the experiment, 33 see Figure 1, such that the effects of artifacts of the methodology on the results in the following can be excluded.…”
Section: Methodssupporting
confidence: 72%
“…The significant underestimation of the band gap of SnO 2 is mainly due to the exchange contribution to the exchange-correlation potential, as it can be overcome by hybrid functional calculations. 30 Although the band gaps are underestimated, we have verified (using the approach of Van de Walle and Martin 31 and Puthenkovilakam et al 32 ) that the type of band alignment at the interface between SnO and SnO 2 agrees with the experiment, 33 see Figure 1, such that the effects of artifacts of the methodology on the results in the following can be excluded.…”
Section: Methodssupporting
confidence: 72%
“…In its various forms and (sometimes) with the addition of small amounts of impurities, ZrO 2 has applications, for example, in refractory materials, solid oxide fuel cell electrolytes, catalyst substrates, protective coatings, functional ceramics, ceramic glazes, oxygen sensors, electro-ceramics, and abrasives and grinding media, etc. [5][6][7][8][9][10][11] Moreover, zirconia is one of the most radiation-resistant ceramics currently known; [12][13][14] therefore it has a particular importance in the nuclear industry. Also it was proposed, together with HfO 2 , as a gate dielectric material in metal-oxide semiconductor devices.…”
Section: Introductionmentioning
confidence: 99%
“…Also it was proposed, together with HfO 2 , as a gate dielectric material in metal-oxide semiconductor devices. 9,11 For all these basic and technological reasons, the structural and electronic properties of zirconia have been extensively studied by different experimental and theoretical techniques in recent years (see, for example, Ref. 15 and references therein).…”
Section: Introductionmentioning
confidence: 99%
“…We continue to suggest how to improve them [1,2], as well thinking of spin-offs for both catalysis [3] and microelectronics [4,8]. The design principles we have proposed may help increase the stability and hence the lifetime of TBC's in the future.…”
Section: Discussionmentioning
confidence: 99%
“…In the process of examining silica, zirconia, and alumina coatings on Ni and NiAl, we completed a spin-off project to characterize the electronic structure of the interfaces between Zr02 or ZrSi04 and Si [4]. The goal of this work was to examine whether such interfaces would be electronically suitable and stable for use in MOSFET (metalorganic-semiconductor field-effect transistor) devices.…”
Section: Characterization Of the Zirconia And Zirconium Silicate Intementioning
confidence: 99%