The recent resurgence of interest in III-V transistor channel materials has come about due to the scaling requirement of Si-based metal oxide semiconductor (MOS) devices [1]. III-V channel materials have much higher bulk electron mobilities than Si (see Table 13.1) and thus expected to provide high channel injection velocities. Among the III-V compounds, gallium arsenide (GaAs) is a prototype material because of its many advantages, such as, 5Â higher electron mobility than Si, the availability of semiinsulating GaAs substrates, and a higher breakdown field over Si to achieve GaAs-based high-speed devices.Nevertheless, III-V materials suffer from a lack of thermodynamically stable gate dielectrics [2], with an acceptable low density of III-V/dielectric interface states, which makes it very difficult to be implemented into future CMOS-type devices. The interfacial density of states (D it ) leads to many problems such as Fermi-level pinning, reduced electron mobility, and instability of device operations. The Fermi-level pinning results in the loss of the modulation of the carrier concentration at the oxide/III-V interface by the gate bias. For oxide/III-V interfaces, the interfacial group III-or V-dangling bonds are partially saturated [3] and they can hardly be fully saturated to obtain a superior high-k/III-V interface with low D it . Furthermore, the partially saturated bonds can induce mid-gap states that lead to Fermi-level pinning. This pinning is most likely due to the presence of III(V)-O bonds and the resultant structural disorders. Therefore, understanding the oxidation and passivation mechanisms of the III-V surface are very useful to gain an important insight to control the quality of high-k/III-V interfaces [4][5][6][7][8].When high-k oxides are deposited upon III-V materials, the III-V/high-k oxide interfaces are much more complicated than the ideal III-V surface alone. The low electronic quality of an III-V/dielectric interface can be attributed to several reasons.High-k Gate Dielectrics for CMOS Technology, First Edition. Edited by Gang He and Zhaoqi Sun.