“…In this context, III-nitride semiconductors, i.e., Ga(In)N, have emerged as one of the most promising materials for next-generation semiconductor photoelectrodes. − They exhibit tunable direct band gap from 0.65 eV (InN) to 3.4 eV (GaN) and have large carrier mobility and high light absorption coefficient . As such, III-nitrides have been intensively studied for PEC water splitting − as well as for other artificial photosynthesis devices. ,− Recently, it has been discovered that the surfaces of III-nitride nanostructures can be engineered to be N-rich, not only for their top c -plane but also for their nonpolar sidewalls, which can protect against photocorrosion and oxidation , and are stable in various electrolytes. ,, Moreover, such N-terminated III-nitride nanostructures can be grown directly on Si wafer without the formation of extensive dislocations, providing distinct opportunities to realize Si-based double-junction PEC water-splitting devices with a nearly ideal energy band gap configuration, i.e., ∼1.1 and 1.8 eV for the bottom Si and top In 0.46 Ga 0.54 N junction, respectively.…”