2014
DOI: 10.1109/jsen.2013.2295057
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Flexible ISFET Biosensor Using IGZO Metal Oxide TFTs and an ITO Sensing Layer

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Cited by 61 publications
(35 citation statements)
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“…For a-IGZO, higher temperatures (i.e. above 400 o C) are known to deteriorate the TFT performance with the films being amorphous till about 400 o C and reported to be polycrystalline above 500 o C. 14 The a-IGZO films annealed at 400 o C have reported [1][2][3] to provide the optimum TFT performance. Hence, the annealing temperature of 400 o C was used for processing a-IGZO to study its sensing characteristics in N 2 and O 2 environments.…”
Section: B Electrical Characterizationmentioning
confidence: 99%
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“…For a-IGZO, higher temperatures (i.e. above 400 o C) are known to deteriorate the TFT performance with the films being amorphous till about 400 o C and reported to be polycrystalline above 500 o C. 14 The a-IGZO films annealed at 400 o C have reported [1][2][3] to provide the optimum TFT performance. Hence, the annealing temperature of 400 o C was used for processing a-IGZO to study its sensing characteristics in N 2 and O 2 environments.…”
Section: B Electrical Characterizationmentioning
confidence: 99%
“…The use of a-IGZO as the active layer and different dielectrics such asTiO 2 , ITO, SiOx, and TaOx as the pH sensitive layers in TFT based ion sensitive field effect transistors (ISFETs) have been reported. [1][2][3][4] High-k dielectrics (Ta 2 O 5 , Al 2 O 3 , Pr 2 O 3 ,TiO 2 , Er 2 O 3 , and HoTiO 3 etc.) and their stacks to reduce lattice mismatch are used to enhance the pH sensitivity with an objective to achieve the maximum sensitivity of 59.5mV/pH (the Nernstian limit) of field effect sensors.…”
Section: Introductionmentioning
confidence: 99%
“…In addition, ITO can be deposited by DC [65][66][67][68], and RF sputtering at low temperatures [69], making it compatible with polymeric substrates. For these reasons, ITO has been widely used as a transparent electrode in flexible sensors [20,[70][71][72][73][74][75][76][77]. Nevertheless, resistivity values below 5 × 10 -4 Ω cm are not easily obtained for fabrication processes at room temperature [67].…”
Section: Amorphous Oxide Conductorsmentioning
confidence: 99%
“…Since the NIL process is based on direct mechanical deformation, the resolution of nanostructures is not limited to light diffraction or beam scattering, which are common in conventional nanolithography techniques. Due to its great potential in large format micronano pattern fabrication, NIL has been widely researched and has already been developed from platetype NIL [8] to roller-type NIL [9,10] to meet the need for novel applications in manufacturing flexible transparent conductive materials as a substitute for traditional indium tin oxide (ITO), which is vital in flexible electronics such as flexible display panels [11,12], flexible solar cells [13][14][15] and flexible sensors [16][17][18].…”
Section: Introductionmentioning
confidence: 99%