the manufacturing processes divide naturally into two general approaches i.e., solution-processing and vacuum processing. In the former approach some or all transistor and circuit elements are deposited from solution and holds out the promise of low-cost, high-volume roll-to-roll (R2R) manufacture of circuits using, for example, inkjet [ 7 ] or gravure printing. [ 8 ] On the other hand, processes requiring vacuum evaporation of one or more component, or photolithography and dry-etching are more suited to batch-processing.Progress has been, and continues to be made, in applying mass-printing R2R processes [ 9 ] with a range of logic circuits being demonstrated [ 10 ] albeit based on singlewalled carbon nanotubes as the active material. High-speed metal patterning and barrier layer deposition are commercially used processes. R2R circuit fabrication based entirely on vacuum evaporation is, therefore, feasible. [ 11 ] For example, saturated-load unipolar ring oscillators (ROs) were produced in a R2R-compatible environment. [ 12 ] Although a stage delay of 46 µs was achieved at a high supply voltage, circuit performance was compromised by a nonoptimal design purposely limited to the resolution and registration capability of a high-speed metal printing process. Nevertheless, the stage delay achieved was much shorter than previously reported for ROs produced using all-solution mass-printing processes ( Table 1 ) . [13][14][15] This refl ects the generally higher mobilities of vacuum-evaporated small-molecules [ 12 ] compared with solutionprocessed small-molecules. [ 16,17 ] Other performance-degrading features of solution R2R-processes include a relatively thick dielectric layer and relatively poor resolution. The former leads to high operating voltages. The latter reduces operating speed by restricting the source-drain gap, i.e., the channel length, L , of the OTFTs to a minimum of about 30-40 µm. Achieving a resolution below ≈10 µm to improve device speed poses a signifi cant near-term challenge for mass-printing processes. Relatively poor registration between different patterned layers is a further problem leading to undesirable parasitic effects. [ 12 ] It is not surprising, therefore, that the signifi cant improvements in organic circuit performances have been demonstrated using the higher resolution approaches derived from silicon technology. At the most basic level, this is confi ned to patterning source-drain electrodes by photolithography to achieve channel lengths of 5 µm High-frequency ring oscillators with sub-microsecond stage delay fabricated from spin-coated fi lms of a specially formulated small-molecule/host-polymer blend are reported. Contacts and interconnects are patterned by photolithography with plasma etching used for creating vias and removing excess material to reduce parasitic effects. The characteristics of transistors with 4.6 µm channel length scale linearly with channel width over the range 60-2160 µm. Model device parameters extracted using Silvaco's Universal Organic Thin Film Transistor...