1999 Proceedings. 49th Electronic Components and Technology Conference (Cat. No.99CH36299)
DOI: 10.1109/ectc.1999.776272
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Flip chip underfill flow characteristics and prediction

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Cited by 10 publications
(2 citation statements)
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“…Void formation is often induced by irregular underfill flow fronts in silicon dies containing non-uniform bump patterns or the edge effect where the underfill flow along die edges advances faster than that in the middle of the die due to a larger bump resistance at the chip inner core [2,3]. With the continuous increase of I/O counts in flip-chip packages, higher bump density and finer pitch size result in longer underfill flow-out time and more voids formed during underfill encapsulation.…”
Section: Introductionmentioning
confidence: 99%
“…Void formation is often induced by irregular underfill flow fronts in silicon dies containing non-uniform bump patterns or the edge effect where the underfill flow along die edges advances faster than that in the middle of the die due to a larger bump resistance at the chip inner core [2,3]. With the continuous increase of I/O counts in flip-chip packages, higher bump density and finer pitch size result in longer underfill flow-out time and more voids formed during underfill encapsulation.…”
Section: Introductionmentioning
confidence: 99%
“…It enhances the reliability performance of the flip chip package. The die size, bump pitch, and stand off height of the package are among the important parameters can affect the underfill flow (4)(5)(6)(7)(8)(9)(10)(11). The presence of flux residue and substrate wettability can also affect underfill flow (12)(13)(14)(15).…”
Section: Introductionmentioning
confidence: 99%