Fluorinated silica glass ablated with ArF excimer laser at low fluence

Solid-state reduction of silica nanoparticles via oxygen abstraction from SiO4 units by polyolefins under mechanical stressing

“…Researchers in the eld of semiconductor etching report that uorine is a powerful disrupter of silica-based compounds. [49][50][51] While the related process is conventionally practiced in liquid 52 or vapor 53 phases, same principles could be applicable in the solid phase. Decrease in the O1s binding energy is closely correlated with decreasing interaction parameter of cation and anion of many metal oxides, 54 which, in turn, parallels to the polarizability.…”

Antimicrobial activity of polysiloxane coatings containing quaternary ammonium-functionalized polyhedral oligomeric silsesquioxane

“…Coatings 18K-Q-12-Cl and 18K-Q-12-Br, which were active toward all three microorganisms, showed the appearance of a new peak at 435 cm À1 assigned to the symmetric stretching of Si-O-Si from the POSS molecule which involves the motion of the oxygen atom along the line bisecting the Si-O-Si angle. [34][35][36] The broadening of the peak around 490 cm À1 indicated a change in the Si-O-Si angular distribution of PDMS in the presence of Q-POSS. 34,37 Q-POSS-containing coatings, 18K-Q-18-Cl and 18K-Q-18-Br, which were not active against any of the microorganisms, had a very small peak or no peak at 430 cm À1 indicating that these coatings had very low concentrations of Q-POSS at the coating surface.…”