Fluorine-doped tin oxide films with a high figure of merit fabricated by spray pyrolysis

Malik, O.; Hidalga-Wade, Francisco Javier De la; Amador, Raquel Ramírez

doi:10.1557/jmr.2015.138

Cited by 12 publications

(11 citation statements)

References 12 publications

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“…UV/vis provided evidence for the incorporation of the silicon nanocrystals into the ITO and it was determined that processing temperatures greater than 300 1C result in oxidation and lead to an increase in sheet resistance. 205,210 A recent study on the AACVD of FTO used a precursor, of the type [ n BuSnCl xÀy F y ], formed in situ by the halide exchange between n-butyltin trichloride and ammonium fluoride. ITO is the most commercially used TCO material but it is followed by fluorine doped tin oxide, SnO 2 :F (FTO) on which there is much information published in the literature.…”

Section: Ternary Main Group Tcosmentioning

confidence: 99%

“…203,204 Commercially available precursors, such as tin chloride and antimony chloride have been used [205][206][207] to deposit thin films via a range of techniques including sol-gel, 208 thermal evaporation 209 and spray pyrolysis. 205,210 A recent study on the AACVD of FTO used a precursor, of the type [ n BuSnCl xÀy F y ], formed in situ by the halide exchange between n-butyltin trichloride and ammonium fluoride. 211 Since isolation of the precursor was not possible, evidence for the formation included XRD identification of the NH 4 Cl side product and XPS of the precursor, indicating the formation of a Sn-F bond.…”

Section: Ternary Main Group Tcosmentioning

confidence: 99%

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Solution based CVD of main group materials

2016

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This critical review focuses on the solution based chemical vapour deposition (CVD) of main group materials with particular emphasis on their current and potential applications. Deposition of thin films of main group materials, such as metal oxides, sulfides and arsenides, have been researched owing to the array of applications which utilise them including solar cells, transparent conducting oxides (TCOs) and window coatings. Solution based CVD processes, such as aerosol-assisted (AA)CVD have been developed due to their scalability and to overcome the requirement of suitably volatile precursors as the technique relies on the solubility rather than volatility of precursors which vastly extends the range of potentially applicable compounds. An introduction into the applications and precursor requirements of main group materials will be presented first followed by a detailed discussion of their deposition reviewed according to this application. The challenges and prospects for further enabling research in terms of emerging main group materials will be discussed.

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Section: Ternary Main Group Tcosmentioning

confidence: 99%

Section: Ternary Main Group Tcosmentioning

confidence: 99%

Solution based CVD of main group materials

2016

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“…The parameters obtained allow to conclude that high-quality FTO and ITO films can be fabricated by a simple and inexpensive spray deposition method. Our recently published works [13,14] give more detailed information about the dependence of the film properties on the doping concentration as well as a comparison of our results with the ones published in literature.…”

Section: Properties Of the Metal Oxide Filmsmentioning

confidence: 72%

“…Fluorine-doped tin oxide (FTO) films [14] were deposited from solution contents a 0.2 M solution of tin chloride (SnCl 4 × 5H 2 O) dissolved in methanol. A small amount of NH 4 F dissolved in water was added in the starting solution for the preparation of the precursor with 0-1 F/Sn molar concentrations.…”

Section: Spray Pyrolysis Processingmentioning

confidence: 99%

Surface-Barrier Photodiodes with Transparent Electrodes for High-Performance Detection in the UV-NIR Spectrum

Malik¹,

Hidalga-Wade²

2017

Optoelectronics - Advanced Device Structures

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The aim of this chapter is to present a short review in the field of design, fabrication technology, and testing of high-efficiency surface-barrier photodiodes with electrodes based on thin-film transparent conducting oxides (TCO) such as tin-doped indium oxide (ITO) and fluorine-doped tin oxide (FTO). Most of this review is based on our own results obtained and reported during the last 30 years. Besides a brief description of the low-cost spray pyrolysis deposition technique, mainly used in our work for deposition of the TCO films on a semiconductor surface, structural, morphological, and optoelectronic properties of these TCO films are discussed. As an example, a successful application of these TCO films is shown and used in high-efficiency surface-barrier photodiodes for a wide spectral range, from near ultraviolet (UV) to near infrared (NIR), and fabricated on different semiconductor substrates such as traditional Si, wide energy band ZnS, and GaP compound semiconductor substrates. The possible use of the Si surface-barrier structures as radiation-resistant detectors and gamma radiation detectors is discussed. The properties of high-efficiency surface-barrier photodiodes based on a perspective ternary semiconductor compound, Hg 3 In 2 Te 6 mercury indium telluride (MIT), for detection of 1.3 μm and 1.55 μm radiation for applications in fiber optics, are also reported.

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“…Therefore, the opto-electrical properties of ZnO depend on the conditions both during and after deposition (Agrawal et al, 2013). USP; The simplicity of the experimental setup, the ability to add the material at desired rates, and the ability to produce homogeneous, cheap and easy in large areas (Malik et al, 2015;Bilgin et al, 2010;Lalasari et al, 2018;Kaleli et al, 2019). As a USP solution-based inexpensive method, it offers the possibility to easily adjust the deposition parameters depending on the desired material properties.…”

Section: Introductionmentioning

confidence: 99%

Effect of Various Precursors on ZnO Thin Films by USP Technique

SAĞLAM

Sarıtaş

Ertuğrul

2021

Erzincan Üniversitesi Fen Bilimleri Enstitüsü Dergisi

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ZnO is one of the main materials used in thin film coating due to its low cost and advantageous properties. The aim of this study is to examine the optical, morphological and structural properties of zinc oxide thin films coated with ultrasonic spray pyrolysis(USP) technique. ZnO thin films were grown at 450°C using different precursor solutions such as zinc acetate and zinc nitrate. Glass substrate was used in these processes. 0.1M and 100 mL solutions were prepared. Growth orientations according to XRD patterns are (002). Bandgap values for zinc acetate and zinc nitrate were measured as 3.25 eV and 3.13 eV, respectively. In addition, as can be seen from the Debye-Scherrer calculations, the ZnO grain size of the films obtained with zinc acetate, which was chosen as the precursor salt, is almost the same as the film obtained with zinc nitrate, which was chosen as the precursor salt. Finally, the amount of oxygen in ZnO films varies depending on different solutions and zinc salts.

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Fluorine-doped tin oxide films with a high figure of merit fabricated by spray pyrolysis

Abstract: Abstract

Cited by 12 publications

References 12 publications

Solution based CVD of main group materials

Solution based CVD of main group materials

Surface-Barrier Photodiodes with Transparent Electrodes for High-Performance Detection in the UV-NIR Spectrum

Effect of Various Precursors on ZnO Thin Films by USP Technique

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