The capture and separation of fluorinated gases (F-gases)
from
N2 has the potential to not only reduce greenhouse gas
emissions but also provide economic benefits for the semiconductor
industry. In this work, two Ni-based metal–organic frameworks
(MOFs), Ni-MOF (Ni(ina)2, ina = isonicotinic
acid) and amine-functionalized NH
2
–Ni-MOF (Ni(3-ain)2, 3-ain = 3-aminoisonicotinic
acid), were constructed for capturing F-gases (CF4 and
NF3). At ambient conditions, both materials exhibit very
high CF4 sorption capacities (2.92 mmol g–1 for Ni-MOF and 2.69 mmol g–1 for NH
2
–Ni-MOF). In
addition, NH
2
–Ni-MOF exhibited a record selectivity of 46.3 for the CF4/N2 mixture at 298 K and 100 kPa, surpassing all benchmark adsorbents,
including Ni-MOF (34.7). The kinetic adsorption tests
demonstrated that Ni-MOF and NH
2
–Ni-MOF performed well for CF4/N2 and NF3/N2 mixtures.
According to grand canonical Monte Carlo (GCMC) simulations, CF4 or NF3 interacts with NH
2
–Ni-MOF by multiple van der Waals
interactions, resulting in stronger interaction than N2. More importantly, dynamic breakthrough experiments verified the
practical separation potential of the two materials for CF4/N2 and NF3/N2 mixtures.