Fluorine incorporation into amorphous hydrogenated carbon films deposited by plasma-enhanced chemical vapor deposition: structural modifications investigated by X-ray photoelectron spectrometry and Raman spectroscopy

Costa, M.E.H. Maia da; Freire, F. L.; Jacobsohn, L.G.; Franceschini, D. F.; Mariotto, G.; Baumvol, I.R.J

doi:10.1016/s0925-9635(00)00506-9

Cited by 26 publications

(14 citation statements)

References 13 publications

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“…As expected, the fluorine content of the films increases as g/cm 3 and 1.6 g/cm 3 ± 0.2 g/cm 3 , which is lower than that of graphite, and attributed to the incorporation of fluorine [14], [37]. the results reported in references [38], [39], [40], [41].…”

Section: Cf Psupporting

confidence: 79%

CFx thin solid films deposited by high power impulse magnetron sputtering: Synthesis and characterization

Schmidt

Greczyński

Goyenola

et al. 2011

Surface and Coatings Technology

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atmosphere. The fluorine content of the films was controlled by varying the CF 4 partial pressure from 0 mPa to 110 mPa at a constant deposition pressure of 400 mPa and a substrate temperature of 110 ºC. The films were characterized regarding their composition, chemical bonding and microstructure as well as mechanical properties by applying elastic recoil detection analysis, Xray photoelectron spectroscopy, Raman spectroscopy, transmission electron microscopy, and nanoindentation. First-principles calculations were carried out to predict and explain Fcontaining carbon thin film synthesis and properties. By geometry optimizations and cohesive energy calculations the relative stability of precursor species including C 2 , F 2 and radicals, resulting from dissociation of CF 4 , were established. Furthermore, structural defects, arising from the incorporation of F atoms in a graphene-like network, were evaluated. All as-deposited CF x films are amorphous. Results from X-ray photoelectron spectroscopy and Raman spectroscopy indicate a graphitic nature of CF x films with x ≤ 0.23 and a polymeric structure for films with x  0.26. Nanoindentation reveals hardnesses between ~1 GPa and ~16 GPa and an elastic recovery of up to 98 %.

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Section: Cf Psupporting

confidence: 79%

CFx thin solid films deposited by high power impulse magnetron sputtering: Synthesis and characterization

Schmidt

Greczyński

Goyenola

et al. 2011

Surface and Coatings Technology

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show abstract

“…In this case, the spectrum must be shifted to even higher energies by another 1.6 eV, and the main peak must be assigned to C-C/C-H bonds affected by the fluorination (C-CF). The spacing of the remaining peaks would be in agreement with both explanations [21][22][23]. Investigations to clarify this interesting question are currently under way.…”

Section: Xpssupporting

confidence: 68%

Surface modification of nanocrystalline diamond/amorphous carbon composite films

Popov

Kulisch

Bliznakov

et al. 2008

Diamond and Related Materials

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“…Studies by mass spectrometry of the species produced during deposition of magnetron sputtered CF n films are also available in literature . Meanwhile, plasma synthesis of fluorinated DLC films and other fluorinated carbon films by using CF 4 as fluorine precursor has been the subject of numerous works, although in the majority of these investigations the emphasis was put on the materials properties rather than on the relationships with the plasma characteristics. Similar works, but using c ‐C 4 F 8 and other fluorinated hydrocarbons as fluorine precursors, can be also found in the recent literature on fluorinated carbon films …”

Section: Introductionmentioning

confidence: 99%

c-C₄F₈Plasmas for the Deposition of Fluorinated Carbon Films

Terriza

Macías-Montero

López‐Santos

et al. 2014

Plasma Process. Polym.

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Highly fluorinated polymeric (CFX), fluorine containing diamond‐like carbon (F‐DLC) and, for comparison, diamond‐like carbon (DLC) films have been plasma deposited in a RF parallel plate reactor by using c‐C4F8 as fluorine precursor and different mixtures of argon, C2H2, and H2. Plasmas have been characterized by optical emission spectroscopy, mass spectrometry, and Langmuir probe measurements. Differences in the film composition and structure have been related with the type of species formed in the plasma and with the self‐bias potential developed at the deposition electrode. Additional experiments using CF4 have confirmed that the formation in the plasmas of neutral or ionized CxFy species with x > 2 is a critical factor for the synthesis of fluorine rich films.

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Fluorine incorporation into amorphous hydrogenated carbon films deposited by plasma-enhanced chemical vapor deposition: structural modifications investigated by X-ray photoelectron spectrometry and Raman spectroscopy

Cited by 26 publications

References 13 publications

CFx thin solid films deposited by high power impulse magnetron sputtering: Synthesis and characterization

CFx thin solid films deposited by high power impulse magnetron sputtering: Synthesis and characterization

Surface modification of nanocrystalline diamond/amorphous carbon composite films

c-C₄F₈Plasmas for the Deposition of Fluorinated Carbon Films

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Fluorine incorporation into amorphous hydrogenated carbon films deposited by plasma-enhanced chemical vapor deposition: structural modifications investigated by X-ray photoelectron spectrometry and Raman spectroscopy

Cited by 26 publications

References 13 publications

CFx thin solid films deposited by high power impulse magnetron sputtering: Synthesis and characterization

CFx thin solid films deposited by high power impulse magnetron sputtering: Synthesis and characterization

Surface modification of nanocrystalline diamond/amorphous carbon composite films

c-C4F8Plasmas for the Deposition of Fluorinated Carbon Films

Contact Info

Product

Resources

About

c-C₄F₈Plasmas for the Deposition of Fluorinated Carbon Films