Fluorine Plasma Treatments of Polypropylene Films, 1 – Surface Characterization

Abstract

a Part 2: cf. ref. [11] In this work, an experimental investigation of fluorine gas (F 2 ) plasma treatment of polypropylene (PP) film reveals the evolution of PP fluorination. Surface analysis of fluorinated PP surfaces describes a surface modification process that is initially quite rapid but slows sharply as the fluorination progresses. The fluorination reaction occurs more rapidly at the PP film surface and evidence of a treatment gradient is seen in the ESCA sampling depth of 10 nm. The increasingly fluorinated surface becomes less reactive to the plasma chemistry and develops a fully fluorinated, cross-linked surface layer that eventually extends the full ESCA sampling depth.

Effect of mechanical, barrier and adhesion properties on oxygen plasma surface modified PP

“…e l s e v i e r . c o m / l o c a t e / i f s e t functional group and the surface roughness can be introduced and also improved in the polymer surface by the plasma (Kirk et al, 2010). By this the mechanical performance and the adhesion property can also be improved.…”

High-performance pentacene thin-film transistor with ZrLaO gate dielectric passivated by fluorine incorporation

“…Oxygen plasma [6,7], N 2 O plasma [8] and fluorine plasma [9] have been reported to modify the dielectric surface and good results were obtained. Moreover, fluorine-based plasma has long been investigated to provide valuable surface properties in organic and inorganic material fields [10][11][12][13][14]. Generally, the operating voltage of OTFTs based on SiO 2 gate dielectric is very high.…”

Modeling discharge and surface processes in capacitively coupled reactors

“…[23][24][25][26] MERIE reactors are also finding continued use for etching of materials for microelectronics fabrication at a time when DF-CCP sources are also being developed. [27] An example of MERIE reactor is shown in Fig. 6, where the static magnetic field is provided by two pairs of electromagnets located on opposite sides of the reactor.…”

“…Dorofeev et al [22] determined that a representative process is, (27) where two chain-ending units are produced. The quantum yield for this process is about 0.25 at 147 nm.…”

“…9c. In the first 6 cm of the reactor, the major photon-activated process is the extraction of H 2 from the fully A comparison of computed and experimental results [27] for functional group surface coverages after 6 seconds of treatment is given in Table 5.7. The prediction for F/C ratio agrees well with the experiment.…”