Flying Circus EUV Source Metrology and Source Development Assessment

Bijkerk, F.; Westen, A. van der; Bruineman, C.; Huiting, Robert; Bruijn, René de; Stuik, Remko; Bakshi, Vivek

doi:10.1117/3.613774.ch27

Cited by 4 publications

(7 citation statements)

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“…They were used in "front-line" experiments like XUV time resolved holography as a part of the imaging system [9], as diffraction limited XUV beam focusing optics for warm dense matter creation [10] and as a part of the delay line for one color pump and probe studies on XUV transmission of solids [11]. Moreover, this kind of optics is nowadays a standard for control of XUV and soft X-ray radiation in many fields of science and technology [12][13][14]. They can fulfill the extreme requirements in terms of figure errors and roughness, wavefront preservation, and stability in the XUV and soft x-ray regime.…”

Section: Introductionmentioning

confidence: 99%

Single shot damage mechanism of Mo/Si multilayer optics under intense pulsed XUV-exposure

Khorsand¹,

Sobierajski²,

Louis³

et al. 2010

Opt. Express

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We investigated single shot damage of Mo/Si multilayer coatings exposed to the intense fs XUV radiation at the Free-electron LASer facility in Hamburg - FLASH. The interaction process was studied in situ by XUV reflectometry, time resolved optical microscopy, and "post-mortem" by interference-polarizing optical microscopy (with Nomarski contrast), atomic force microscopy, and scanning transmission electron microcopy. An ultrafast molybdenum silicide formation due to enhanced atomic diffusion in melted silicon has been determined to be the key process in the damage mechanism. The influence of the energy diffusion on the damage process was estimated. The results are of significance for the design of multilayer optics for a new generation of pulsed (from atto- to nanosecond) XUV sources.

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Section: Introductionmentioning

confidence: 99%

Single shot damage mechanism of Mo/Si multilayer optics under intense pulsed XUV-exposure

Khorsand¹,

Sobierajski²,

Louis³

et al. 2010

Opt. Express

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show abstract

“…They were used in pilot FEL experiments like: XUV time resolved holography as a part of imaging system [5], warm dense matter creation for diffraction limited XUV beam focusing [6] and as a part of the delay line for one color pump and probe studies on XUV transmission of solids [7]. Moreover, this kind of optics is nowadays a standard for control of XUV and soft X-ray radiation in many fields of science and technology [8,9,10]. They can fulfill the extreme requirements in terms of figure and roughness errors, wave front preservation, and stability in the XUV and soft x-rays regime.…”

Section: Introductionmentioning

confidence: 99%

Damage studies of multilayer optics for XUV free electron lasers

et al. 2009

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We exposed standard Mo/Si multilayer coatings, optimized for 13.5 nm radiation to the intense femtosecond XUV radiation at the FLASH free electron laser facility at intensities below and above the multilayer ablation threshold. The interaction process was studied in-situ with reflectometry and time resolved optical microscopy, and ex-situ with optical microscopy (Nomarski), atomic force microscopy and high resolution transmission electron microscopy. From analysis of the size of the observed craters as a function of the pulse energy the threshold for irreversible damage of the multilayer could be determined to be 45 mJ/cm 2 . The damage occurs on a longer time scale than the XUV pulse and even above the damage threshold XUV reflectance has been observed showing no measurable loss up to a power density of 10 13 W/cm 2 . A first explanation of the physics mechanism leading to damage is given.

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“…The results were published as reports, and the FC activity set a standard for diagnostic tool and measurement procedures. [20][21][22][23]…”

Section: Absolutely Calibrated In-band Energy Measurementsmentioning

confidence: 99%

“…An example table of measurement quantities and standardized units as assessed by the Flying Circus program can be found in Ref. 23.…”

Section: Flying Circus (Fc) Conceptmentioning

confidence: 99%

EUV Source Metrology

Bayraktar,

Versolato,

Bijkerk

et al. 2023

Photon Sources for Lithography and Metrology

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13.1 Introduction 13.2 Absolutely Calibrated In-band Energy Measurements 13.2.1 Flying Circus (FC) concept 13.2.2 Extension of the FC concept for imaging 13.2.3 Narrowband and tuneable anomalous transmission filters 13.3 Broadband Spectroscopy with a Transmission Grating Spectrometer 13.3.1 Structure and fabrication of high-resolution transmission gratings 13.3.2 Filters for spectroscopy from the soft-x-ray-to visible-wavelength range 13.3.3 Spectral characteristics of various EUV photon sources 13.3.4 High-harmonic-generation source 13.3.5 Discharge-produced plasma source 13.3.6 CO 2 -laser-produced industrial EUVL sources 13.3.7 Nd:YAG-laser-produced plasma source 13.4 Conclusions and Outlook

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Flying Circus EUV Source Metrology and Source Development Assessment

Cited by 4 publications

References 0 publications

Single shot damage mechanism of Mo/Si multilayer optics under intense pulsed XUV-exposure

Single shot damage mechanism of Mo/Si multilayer optics under intense pulsed XUV-exposure

Damage studies of multilayer optics for XUV free electron lasers

EUV Source Metrology

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