Focused helium-ion-beam-induced deposition

Alkemade, P.F.A.; Miro, Hozanna

doi:10.1007/s00339-014-8763-y

Cited by 42 publications

(40 citation statements)

References 54 publications

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“…The main IBID drawback; however, compared with FEBID is the difficulty to monitor the deposition process in situ. Despite the fact that the angular spread of secondary electrons is larger in IBID, thus resulting in lower spatial resolution than FEBID, recent breakthroughs in He ion systems [65,106] resulted in the demonstration of the world-record spatial deposition resolution combined with in situ monitoring capability. Figure 12 depicts 3D structures fabricated via He-IBID.…”

Section: Ion Beam Induced Processesmentioning

confidence: 99%

Tipping solutions: emerging 3D nano-fabrication/ -imaging technologies

et al. 2017

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The evolution of optical microscopy from an imaging technique into a tool for materials modification and fabrication is now being repeated with other characterization techniques, including scanning electron microscopy (SEM), focused ion beam (FIB) milling/imaging, and atomic force microscopy (AFM). Fabrication and in situ imaging of materials undergoing a three-dimensional (3D) nano-structuring within a 1−100 nm resolution window is required for future manufacturing of devices. This level of precision is critically in enabling the cross-over between different device platforms (e.g. from electronics to micro-/ nano-fluidics and/or photonics) within future devices that will be interfacing with biological and molecular systems in a 3D fashion. Prospective trends in electron, ion, and nano-tip based fabrication techniques are presented.

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Section: Ion Beam Induced Processesmentioning

confidence: 99%

Tipping solutions: emerging 3D nano-fabrication/ -imaging technologies

et al. 2017

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“…The corresponding techniques are known as FEBID (Focused Electron Beam-induced Deposition) and FIBID (Focused Ion Beam-induced Deposition), respectively. In the past, various review articles have been devoted to the detailed description of the phenomena involved in room-temperature (RT) FEBID and FIBID processes, and the reader is referred to these references for their comprehensive understanding [8][9][10][11][12][13]. Here, we provide a view that is simplified but sufficient to understand the main differences between the RT and the cryogenic processes.…”

Section: Focused Electron/ion Beam-induced Deposition Techniquesmentioning

confidence: 99%

Comparison between Focused Electron/Ion Beam-Induced Deposition at Room Temperature and under Cryogenic Conditions

2019

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In this contribution, we compare the performance of Focused Electron Beam-induced Deposition (FEBID) and Focused Ion Beam-induced Deposition (FIBID) at room temperature and under cryogenic conditions (the prefix "Cryo" is used here for cryogenic). Under cryogenic conditions, the precursor material condensates on the substrate, forming a layer that is several nm thick. Its subsequent exposure to a focused electron or ion beam and posterior heating to 50 • C reveals the deposit. Due to the extremely low charge dose required, Cryo-FEBID and Cryo-FIBID are found to excel in terms of growth rate, which is typically a few hundred/thousand times higher than room-temperature deposition. Cryo-FIBID using the W(CO) 6 precursor has demonstrated the growth of metallic deposits, with resistivity not far from the corresponding deposits grown at room temperature. This paves the way for its application in circuit edit and the fast and direct growth of micro/nano-electrical contacts with decreased ion damage. The last part of the contribution is dedicated to the comparison of these techniques with other charge-based lithography techniques in terms of the charge dose required and process complexity. The comparison indicates that Cryo-FIBID is very competitive and shows great potential for future lithography developments.

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“…However, most 3D nanofabrication work using HIM is based on ion beam-induced deposition, [42][43][44] direct milling, [45,46] and ion beam-induced nanotumefaction. However, most 3D nanofabrication work using HIM is based on ion beam-induced deposition, [42][43][44] direct milling, [45,46] and ion beam-induced nanotumefaction.…”

mentioning

confidence: 99%

“…3D fabrication. However, most 3D nanofabrication work using HIM is based on ion beam-induced deposition, [42][43][44] direct milling, [45,46] and ion beam-induced nanotumefaction. [47] To the best of the authors' knowledge, 3D nanofabrication using resist crosslinking in a locally confined volume has not been demonstrated for HIBL.…”

mentioning

confidence: 99%

3D Volumetric Energy Deposition of Focused Helium Ion Beam Lithography: Visualization, Modeling, and Applications in Nanofabrication

Zhu

Alkemade

Veldhoven

et al. 2018

Adv Materials Inter

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COMMUNICATION (1 of 8)charged-particle beam lithography technique, has shown great potential in 3D nanoscale fabrication with high precision at the submicron scale. 3D nanofabrication has been demonstrated using low-energy EBL based on the saturation of exposure depth and width, [24] multiple electron beam exposures at different exposure energies, [20,25] continuous overlay electron beam exposures, [26][27][28] and grayscale EBL [29,30] among others. To the same end, 3D nanostructures have also been fabricated in bilayer resist stacks by EBL, [31] which was enabled by the difference in dose sensitivity of two different resists. However, in this approach, multiple coatings of resists with different sensitivities are required. Moreover, there is a limited selection of suitable combinations of high-resolution resists. The recently introduced scanning helium ion microscope (HIM) is a superior tool in high-resolution imaging, thanks to its minimized sample charging through flood charge neutralization, enhanced depth of field, and short De Broglie wavelength. As a scanning focused-ion-beam instrument, HIM can perform high-resolution nanofabrication by milling, [32,33] etching, [34] deposition, [35,36] modification of materials, [37,38] and lithographic patterning in resists. [39,40] When used as a high-resolution lithography tool, helium ion beam lithography (HIBL) has achieved record-high-resolution patterning of 8 nm pitch dense lines. [41] Moreover, the narrow interaction volume of helium ions in resist materials makes HIBL a promising candidate for In this paper, 3D volumetric energy deposition and local crosslinking of hydrogen silsesquioxane (HSQ) are experimentally and numerically explored in focused helium ion beam lithography (HIBL). In particular, a throughmembrane exposure method is developed to make visible and subsequently to measure the 3D interaction volume and energy deposition of helium ions in HSQ. By comparing the actual dimensions of the crosslinked HSQ structures with Monte Carlo modeling of the spatial distribution of the energy deposition, the critical energy density for crosslinking HSQ is obtained. Finally, 3D nanofabrication of complex crosslinked HSQ nanostructures such as embedded nanochannels and suspended grids is demonstrated using two different exposure configurations. The proposed method expands the 2D point spread function of HIBL into three dimensions, thus opening a new avenue for nanoscale 3D fabrication. Helium Ion Beam LithographyThe ORCID identification number(s) for the author(s) of this article can be found under https://doi.org/10.1002/admi.201800203.3D micro/nanostructures are important for electronic, [1] photonic, [2] plasmonic, [3] microfluidic, [4] bio-MEMS, [5] and chemical synthesis [6] applications. Directly patterning materials into 3D micro/nanostructures has recently attracted considerable attention. Significant effort has been devoted to investigating methods for defining functional 3D micro/nanoscale structures, including direct material deposition, [7][8][9][10] ...

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Focused helium-ion-beam-induced deposition

Cited by 42 publications

References 54 publications

Tipping solutions: emerging 3D nano-fabrication/ -imaging technologies

Tipping solutions: emerging 3D nano-fabrication/ -imaging technologies

Comparison between Focused Electron/Ion Beam-Induced Deposition at Room Temperature and under Cryogenic Conditions

3D Volumetric Energy Deposition of Focused Helium Ion Beam Lithography: Visualization, Modeling, and Applications in Nanofabrication

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