Focused ion beam lithography of multiperiod gratings for a wavelength-division-multiplexed transmitter laser array

The capacity of chemically-assisted focused ion beam (FIB) etching systems to undertake direct and highly anisotropic erosion of thin and thick gold (or other high atomic number {Z}) coatings on X-ray mask membranes/ substrates provides new levels of precision, flexibility, simplification and rapidity in the manufacture of mask absorber patterns, allowing for fast prototyping of highaspect ratio, high-resolution masks for deep X-ray lithography for the LIGA process. In preliminary demonstrations, an automated FIB system operating at 30 keV with a gallium liquid metal source and an iodine gas injection system was used for direct milling into a few micrometer thick gold of microstructures into the sub-hundred nanometer regime. Three-dimensional micromachining in bulk diamond is also reported to illustrate the capability of the technique.

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Fast prototyping of high-aspect ratio, high-resolution X-ray masks by gas-assisted focused ion beam

Malek

Hartley

Neogi³

2003

Microsystem Technologies

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Ultrarapid nanostructuring of poly(methylmethacrylate) films using Ga+ focused ion beams

Liu¹,

Longo²,

Hull³

2003

Applied Physics Letters

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Topographical patterns were fabricated with speeds >103 features per second into poly(methylmethacrylate) (PMMA) films with a Ga+ focused ion beam. This material removal rate is orders of magnitude greater than expected in conventional sputtering. The relevant ion-beam sputtering parameters have been investigated to explore the mechanism of the extraordinary materials removal rate. It is speculated that structural changes during ion bombardment, specifically a beam-enhanced unzipping reaction of the PMMA chains, play an important role for the high material removal rate. These high throughput PMMA topographic patterns can be used as masters for high-resolution elastomer molding and microcontact printing.

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Precise wavelength control for DFB laser diodes by novel corrugation delineation method

Muroya

Nakamura

Yamada

et al. 1997

IEEE Photon. Technol. Lett.

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Focused ion beam lithography of multiperiod gratings for a wavelength-division-multiplexed transmitter laser array

Abstract: Articles you may be interested inThree-dimensional electron-beam lithography using an all-dry resist process Fabrication of InP-based wavelength division multiplexing arrayed waveguide filters using chemically assisted ion beam etching

Cited by 4 publications

References 6 publications

Fast prototyping of high-aspect ratio, high-resolution X-ray masks by gas-assisted focused ion beam

Fast prototyping of high-aspect ratio, high-resolution X-ray masks by gas-assisted focused ion beam

Ultrarapid nanostructuring of poly(methylmethacrylate) films using Ga+ focused ion beams

Precise wavelength control for DFB laser diodes by novel corrugation delineation method

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