Focused ion beam lithography-overview and new approaches

Arshak, K.; Mihov, Miroslav; Arshak, A.; McDonagh, D.; Sutton, D.

doi:10.1109/icmel.2004.1314862

Cited by 18 publications

(20 citation statements)

References 12 publications

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“…Gallium (Ga + ) ions are typically used in FIB, 172 and can be used to pattern a resist, similar to that of EBL, which can then be used as a mask for the deposition or etching of metal. However, FIB can also be used as a direct (i.e., maskless) physical patterning tool, through milling or FIB-induced deposition.…”

Section: Preparation Of Silver Nanostructuresmentioning

confidence: 99%

Controlling the Synthesis and Assembly of Silver Nanostructures for Plasmonic Applications

et al. 2011

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Section: Preparation Of Silver Nanostructuresmentioning

confidence: 99%

Controlling the Synthesis and Assembly of Silver Nanostructures for Plasmonic Applications

et al. 2011

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“…Reduction of the feature size is beneficial as it often results in the reduction of the amount of analyte or reagent required, permits an increased density of sensor and chip elements, and faster reaction or response times [11;12]. At the micrometer level, protein patterning has been achieved by the application of techniques such as photolithography [13;14] and microcontact printing [15;16]. These approaches prepare surfaces such that discrete regions of reactive terminal groups (e.g., self-assembled monolayers (SAMs)), organic thin films, or polymers, are created for subsequent protein adsorption [17].…”

Section: Introductionmentioning

confidence: 99%

Selective filling of nanowells in nanowell arrays fabricated using polystyrene nanosphere lithography with cytochrome P450 enzymes

Wollenberg¹,

Jett²,

Wu³

et al. 2012

Nanotechnology

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This work describes an original and simple technique for protein immobilization into nanowells, fabricated using nanopatterned-array fabrication methods, while ensuring the protein retains the normal biological activity. Nanosphere-lithography was used to fabricate a nanowell array with nanowells that were 100 nm in diameter and a periodicity of 500 nm. The base of the nanowells was gold and the surrounding material was silicon dioxide. The different surface chemistries of these materials were used to attach two different self-assembled monolayers (SAM) with different affinities for the protein used here, cytochrome P450 (P450). The nanowell SAM, a methyl terminated thiol, had high affinity for the P450. The surrounding SAM, a polyethylene glycol silane, displayed very little affinity toward the P450 isozyme CYP2C9, as demonstrated by x-ray photoelectron spectroscopy and surface plasmon resonance. The regularity of the nanopatterned array was examined by scanning electron microscopy and atomic force microscopy. P450-mediated metabolism experiments of known substrates demonstrated that the nanowell bound P450 enzyme exceeded its normal activity, as compared to P450 solutions, when bound to the methyl terminated self-assembled monolayer. The nanopatterned array chips bearing P450 display long term stability and give reproducible results making them potentially useful for high throughput screening assays or as nanoelectrode arrays.

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“…Helium ion beams [25,26] as well as neon ion beams [28] have recently been investigated. Another way to effectively increase resist thickness while using heavier ions is to move away from traditional resist exposure and take advantage of ion implantation effects that can produce a negative resist pattern if developed by reactive ion etching [61][62][63]. This is a type of direct "hard mask" patterning technique that we discuss next.…”

Section: Lithography On Resistsmentioning

confidence: 99%

Direct-Write Ion Beam Lithography

Joshi‐Imre

Bauerdick

2014

Journal of Nanotechnology

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Patterning with a focused ion beam (FIB) is an extremely versatile fabrication process that can be used to create microscale and nanoscale designs on the surface of practically any solid sample material. Based on the type of ion-sample interaction utilized, FIB-based manufacturing can be both subtractive and additive, even in the same processing step. Indeed, the capability of easily creating three-dimensional patterns and shaping objects by milling and deposition is probably the most recognized feature of ion beam lithography (IBL) and micromachining. However, there exist several other techniques, such as ion implantation- and ion damage-based patterning and surface functionalization types of processes that have emerged as valuable additions to the nanofabrication toolkit and that are less widely known. While fabrication throughput, in general, is arguably low due to the serial nature of the direct-writing process, speed is not necessarily a problem in these IBL applications that work with small ion doses. Here we provide a comprehensive review of ion beam lithography in general and a practical guide to the individual IBL techniques developed to date. Special attention is given to applications in nanofabrication.

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Focused ion beam lithography-overview and new approaches

Cited by 18 publications

References 12 publications

Controlling the Synthesis and Assembly of Silver Nanostructures for Plasmonic Applications

Controlling the Synthesis and Assembly of Silver Nanostructures for Plasmonic Applications

Selective filling of nanowells in nanowell arrays fabricated using polystyrene nanosphere lithography with cytochrome P450 enzymes

Direct-Write Ion Beam Lithography

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