2019
DOI: 10.3390/nano9101452
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Formation and Characterization of Hole Nanopattern on Photoresist Layer by Scanning Near-Field Optical Microscope

Abstract: Patterning of lines of holes on a layer of positive photoresist SX AR-P 3500/6 (Allresist GmbH, Strausberg, Germany) spin-coated on a quartz substrate is carried out by using scanning near-field optical lithography. A green 532 nm-wavelength laser, focused on a backside of a nanoprobe of 90 nm diameter, is used as a light source. As a result, after optimization of parameters like laser power, exposure time, or sleep time, it is confirmed that it is possible to obtain a uniform nanopattern structure in the phot… Show more

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Cited by 9 publications
(3 citation statements)
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“…In addition to the laser properties, the spot size, the photoresist material, and the acceptable writing speed are also important requirements for creating a high fidelity pattern [ 42 ]. Despite the fact that this method can achieve finely patterned structures [ 43 , 44 ], there are cases in which the relief model is different from the design, which is inclusively due to mechanical instabilities and deformations caused by the processes of chemical development and drying or by the mechanical drifting of the focal spot position with respect to the sample [ 45 ]. However, recently, Yulianto et al have overcome some of these limitations by replacing the conventional live monitoring of patterns based on wide-field microscopy with a photoluminescence scanning method ( Figure 3 a).…”
Section: Top–down Lithographic Methodologiesmentioning
confidence: 99%
“…In addition to the laser properties, the spot size, the photoresist material, and the acceptable writing speed are also important requirements for creating a high fidelity pattern [ 42 ]. Despite the fact that this method can achieve finely patterned structures [ 43 , 44 ], there are cases in which the relief model is different from the design, which is inclusively due to mechanical instabilities and deformations caused by the processes of chemical development and drying or by the mechanical drifting of the focal spot position with respect to the sample [ 45 ]. However, recently, Yulianto et al have overcome some of these limitations by replacing the conventional live monitoring of patterns based on wide-field microscopy with a photoluminescence scanning method ( Figure 3 a).…”
Section: Top–down Lithographic Methodologiesmentioning
confidence: 99%
“…A second general set of methods consists in aperture-less approaches, where the near-field light is emitted from the surface due to external illumination that is scattered off of a sharp tip to be detected likewise in the far-field [4]. The use of the same principle as the one for imaging structures with nanometer resolution, but for the modification of materials, has been demonstrated with different photosensitive materials, polymers, metals, and semiconductors, to name a few [60]. Here, when the near-field enhancement overcomes the required ablation fluence for a given material, it is possible to produce permanent modifications with nanometer resolution and high reproducibility.…”
Section: Plasmonic-based Approach: Snom Probesmentioning
confidence: 99%
“…What's more, the restriction of light by nanoscale apertures of SNOM tip provides immense potential to realize high-resolution lithography. Several lithography researches have been conducted on photoresists utilizing the conventional tapered optical fiber [10][11][12][13][14][15][16][17][18][19][20][21][22][23][24][25]. The end of the fiber is a metal coated tapered tip, with a nanoscale aperture at the apex.…”
Section: Introductionmentioning
confidence: 99%