Formation and direct writing of color centers in LiF using a laser-induced extreme ultraviolet plasma in combination with a Schwarzschild objective

Barkusky, Frank; Peth, Christian; Mann, Klaus; Feigl, Torsten; Kaiser, Norbert

doi:10.1063/1.2072147

Cited by 44 publications

(23 citation statements)

References 18 publications

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“…The plasma is generated in the center of a vacuum chamber, which is evacuated below 10 −4 mbar due to the low mean free path of EUV radiation at atmospheric pressure. An EUV Schwarzschild objective consisting of two spherical, annular mirror substrates coated with Mo/Si multilayers (reflectivity R ≈ 0.65@13.5 nm) provides high EUV fluences [13]. The incidence angles on the sample range from 12.7 • to 26.6 • (mean angle ≈20 • ) according to the numerical aperture of the Schwarzschild objective [9].…”

Section: Methodsmentioning

confidence: 99%

EUV damage threshold measurements of Mo/Si multilayer mirrors

et al. 2012

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We present 1-on-1 and 10-on-1 damage threshold investigations on Mo/Si multilayers with EUV radiation of 13.5 nm wavelength, using a table-top laser produced plasma source based on solid gold as target material. The experiments were performed on different types of Mo/Si mirror, showing no significant difference in single pulse damage thresholds. However, the damage threshold for ten pulses is ≈60 % lower than the single pulse threshold, implying a defect dominated damage process. Using Nomarski (DIC) and atomic force microscopy (AFM) we analysed the damage morphologies, indicating a primarily thermally induced damage mechanism. Additionally, we studied the radiationinduced change of reflectivity upon damage of a multilayer mirror.

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Section: Methodsmentioning

confidence: 99%

EUV damage threshold measurements of Mo/Si multilayer mirrors

et al. 2012

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“…In order to achieve high EUV fluences, a Schwarzschild objective with a demagnification of 9.8× at a maximum numerical aperture of 0.4 was employed [24]. It consists of two spherical, annular mirror substrates coated with a Mo/Si multilayer system (reflectivity R ∼ 0.65 per mirror at 13.5 nm).…”

Section: Methodsmentioning

confidence: 99%

Ablation of polymers by focused EUV radiation from a table-top laser-produced plasma source

2011

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We have investigated ablation of polymers with radiation of 13.5 nm wavelength, using a table-top laser produced plasma source based on solid gold as target material. A Schwarzschild objective with Mo/Si multilayer coatings was adapted to the source, generating an EUV spot of 5 µm diameter with a maximum energy density of ∼1.3 J/cm 2 . In combination with a Zirconium transmission filter, radiation of high spectral purity (2% bandwidth) can be provided on the irradiated spot. Ablation experiments were performed on PMMA, PTFE and PC. Ablation rates were determined for varying fluences using atomic force microscopy and white light interferometry. The slopes of these curves are discussed with respect to the chemical structure of the polymers. Additionally, the ablation behavior in terms of effective penetration depths, threshold fluences and incubation effects is compared to literature data for higher UV wavelength.

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“…Positron Emission Tomography (PET) cancer scans use 18 F as a positron emitter and radioactive dating, typically examining 14 C concentrations, is used to determine the age of materials important for archaeologic studies and examining geologic history.…”

Section: Introductionmentioning

confidence: 99%

“…Such properties require systems for which the constituent elements have small mass so that isotope variation can give relatively large changes to the nuclear masses, e.g., ultra-small-mass rocksalt compounds LiH and LiF, both of which have a significant amount of measured data for both dispersions and κ. Natural isotopic variance of Li is 7.6% 6 Li and 92.4% 7 Li, while H and F LiF is used in radiation detection [13] and ultraviolet optics [14], and LiF salts are used as solvents in nuclear reactors [15].…”

Section: Introductionmentioning

confidence: 99%

Isotope scattering and phonon thermal conductivity in light atom compounds: LiH and LiF

Lindsay

2016

Phys. Rev. B

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Engineered isotope variation is a pathway toward modulating lattice thermal conductivity (κ) of a material through changes in phonon-isotope scattering. The effects of isotope variation on intrinsic thermal resistance is little explored, as varying isotopes have relatively small differences in mass and thus do not affect bulk phonon dispersions. However, for light elements isotope mass variation can be relatively large (e.g., hydrogen and deuterium). Using a first principles Peierls-Boltzmann transport equation approach the effects of isotope variance on lattice thermal transport in ultra-low-mass compound materials LiH and LiF are characterized. The isotope mass variance modifies the intrinsic thermal resistance via modulation of acoustic and optic phonon frequencies, while phonon-isotope scattering from mass disorder plays only a minor role. This leads to some unusual cases where κ values of isotopically pure systems ( 6 LiH, 7 Li 2 H and 6 LiF) are lower than the values from their counterparts with naturally occurring isotopes and phonon-isotope scattering. However, these κ differences are relatively small. The effects of temperature-driven lattice expansion on phonon dispersions and calculated κ are also discussed.This work provides insight into lattice thermal conductivity modulation with mass variation and the interplay of intrinsic phonon-phonon and phonon-isotope scattering in interesting light atom systems.

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Formation and direct writing of color centers in LiF using a laser-induced extreme ultraviolet plasma in combination with a Schwarzschild objective

Cited by 44 publications

References 18 publications

EUV damage threshold measurements of Mo/Si multilayer mirrors

EUV damage threshold measurements of Mo/Si multilayer mirrors

Ablation of polymers by focused EUV radiation from a table-top laser-produced plasma source

Isotope scattering and phonon thermal conductivity in light atom compounds: LiH and LiF

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