Formation and properties of silicon vacancies in MPCVD-grown polycrystalline diamond

Raj, Rahul; Pradeep, K G; Rao, M S Ramachandra

doi:10.1007/s12034-024-03284-3

Bull Mater Sci

2024

DOI: 10.1007/s12034-024-03284-3

|View full text |Cite

Formation and properties of silicon vacancies in MPCVD-grown polycrystalline diamond

Rahul Raj,

K G Pradeep,

M S Ramachandra Rao

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

Supporting

Mentioning

Contrasting

Year Published

2024

Publication Types

Select...

Article1

Relationship

Self Cite0

Independent1

Authors

Journals

Cited by 1 publication

References 27 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

Reactive Radical Etching of Quartz by Microwave Activated CH₄/H₂ Plasmas Promotes Gas Phase Nanoparticle Formation

Ashfold,

Curchod,

Hollas

et al. 2024

J. Phys. Chem. A

View full text Add to dashboard Cite

An attenuation of visible probe radiation identified in earlier absorption studies of microwave plasma-activated CH 4 / H 2 /Ar gas mixtures is shown to arise from nanoparticles in underpumped regions on opposing sides of a reactor used for diamond chemical vapor deposition. The present modeling studies highlight (i) ejection of Si-containing species into the gas phase by reactive radical etching of the quartz window through which the microwave radiation enters the reactor, enabled by suitably high window temperatures (T SiO2 ) and the synergistic action of near-window H atoms and C y H x radicals; (ii) subsequent processing of the ejected material, some of which are transported to and accumulate in stagnation regions in the entrance to the reactor side arms; and (iii) the importance of Si in facilitating homogeneous gas phase nucleation, clustering, and nanoparticle growth in these regions. The observed attenuation, its probe wavelength dependence, and its variations with changes in process conditions can all be rationalized by a combination of absorption and scattering contributions from Si/C/H containing nanoparticles with diameters d in the range of 50−100 nm. Possible implications for Si incorporation in CVD diamond samples are discussed.

show abstract

Reactive Radical Etching of Quartz by Microwave Activated CH₄/H₂ Plasmas Promotes Gas Phase Nanoparticle Formation

Ashfold,

Curchod,

Hollas

et al. 2024

J. Phys. Chem. A

View full text Add to dashboard Cite

show abstract

scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.

Contact Info

customersupport@researchsolutions.com

10624 S. Eastern Ave., Ste. A-614

Henderson, NV 89052, USA

This site is protected by reCAPTCHA and the Google Privacy Policy and Terms of Service apply.

Blog Terms and Conditions API Terms Privacy Policy Contact Cookie Preferences Do Not Sell or Share My Personal Information

Made with 💙 for researchers

Part of the Research Solutions Family.

Formation and properties of silicon vacancies in MPCVD-grown polycrystalline diamond

Cited by 1 publication

References 27 publications

Reactive Radical Etching of Quartz by Microwave Activated CH₄/H₂ Plasmas Promotes Gas Phase Nanoparticle Formation

Reactive Radical Etching of Quartz by Microwave Activated CH₄/H₂ Plasmas Promotes Gas Phase Nanoparticle Formation

Contact Info

Product

Resources

About

Formation and properties of silicon vacancies in MPCVD-grown polycrystalline diamond

Cited by 1 publication

References 27 publications

Reactive Radical Etching of Quartz by Microwave Activated CH4/H2 Plasmas Promotes Gas Phase Nanoparticle Formation

Reactive Radical Etching of Quartz by Microwave Activated CH4/H2 Plasmas Promotes Gas Phase Nanoparticle Formation

Contact Info

Product

Resources

About

Reactive Radical Etching of Quartz by Microwave Activated CH₄/H₂ Plasmas Promotes Gas Phase Nanoparticle Formation

Reactive Radical Etching of Quartz by Microwave Activated CH₄/H₂ Plasmas Promotes Gas Phase Nanoparticle Formation