Formation of (113) texture in fcc nitride thin films and its influence on the film properties

Shetty, Akshath R.; Karimi, A.

doi:10.1016/j.tsf.2012.08.062

Cited by 8 publications

(7 citation statements)

References 29 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…In our study, the off-axis tilt of c-200 texture cannot be attributed to the oblique incidence of metal vapours toward the substrate, as previously argued [27,28,36], because perfect alignment of c-200 texture along the GD is observed with film deposited at the same geometrical configuration (i.e., 35° inclination angle), but at a relatively lower Ts of 250 °C. Our in-situ stress analysis (see Figure 5 (a-d)) revealed that the stress level in films is also not responsible for the tilt of the c-200 texture as proposed by Falub et al [17] and Karimi et al [34]. The Al0.50Ti0.50N thin film deposited at Ts = 250 °C shows high stress state (see Figure 5 (a)), but the c-200 planes are perfectly textured along the GD.…”

Section: Resultssupporting

confidence: 66%

“…Between films deposited at Ts = 450 °C and 600 °C, the latter shows a lower stress (Figure 5 (b-c)) and a higher offaxis tilt angle of c-200 than the former ones, contradicting the predictions by Falub et al [17] and Karimi et al [34]. A consistent increase in tilt angle with an increase in substrate temperature is also in contradiction to the model proposed by Karimi et al [34].…”

Section: Resultsmentioning

confidence: 55%

“…Falub et al argued an interdependence of texture and stress in arc evaporated AlTiN thin films and suggested stress can influence the texture formation, and the tilt angle increases with an increase in the level of stress in the films [17]. A similar interpretation is made for CrN [31][32][33], and Ti0.67Al0.33N [34] thin films, where the transition of texture from c-200 to c-113 is attributed to a decrease in stress and film density. Karimi et al suggest that competitive growth promotes the formation of c-111-oriented grains, and to accommodate growth of this c-111-oriented grain, the c-200-oriented grains are tilted away from the GD [35].…”

Section: Resultsmentioning

confidence: 87%

See 2 more Smart Citations

Dynamic Evolution of Internal Stress, Grain Growth, and Crystallographic Texture in Arc-Evaporated Altin Thin Films Using In-Situ Synchrotron X-Ray Diffraction

Nayak,

Hsu,

Boyd

et al. 2024

Preprint

View full text Add to dashboard Cite

Section: Resultssupporting

confidence: 66%

Section: Resultsmentioning

confidence: 55%

Section: Resultsmentioning

confidence: 87%

See 1 more Smart Citation

Dynamic Evolution of Internal Stress, Grain Growth, and Crystallographic Texture in Arc-Evaporated Altin Thin Films Using In-Situ Synchrotron X-Ray Diffraction

Nayak,

Hsu,

Boyd

et al. 2024

Preprint

View full text Add to dashboard Cite

“…Commonly, Ti 1-x Al x N coatings deposited by physical vapor deposition exhibit a fiber texture with a preferred orientation that may be controlled by, e.g., the bias or the film thickness [27][28][29][30][31][32]. This preferred orientation is one of the factors determining the cutting behavior due to the anisotropic elastic properties of Ti 1-x Al x N [12] and we have earlier shown [33] a strong alignment of the spinodally decomposed domains along the elastically softer <100> directions.…”

Section: Introductionmentioning

confidence: 99%

Improved metal cutting performance with bias-modulated textured Ti0.50Al0.50N multilayers

Norrby

Johansson-Jöesaar

Odén

2014

Surface and Coatings Technology

View full text Add to dashboard Cite

show abstract

“…The change in bias to -70 V increases the ion energy during bombardment which results in a larger probability for re-nucleation of new grains and thus a smaller grain size [62]. In general, PVD grown TiAlN exhibits a fiber texture with a preferred orientation controlled by the bias or coating thickness [63][64][65][66][67][68]. This is exemplified in Figure 6 From the -2 diffractogram, the preferred orientation can be described by the texture coefficient, TC, which is defined in Eq.…”

Section: Coating Growthmentioning

confidence: 99%

Microstructural evolution of TiAlN hard coatings at elevated pressures and temperatures

Norrby¹

2014

View full text Add to dashboard Cite

LINKÖPING 2014The cover image shows nine two-dimensional x-ray diffractograms of TiAlN merged into one quarter circle. Going counterclockwise from an as-deposited sample, the parts show different stages of annealing. The color scheme is chosen to represent the motto "Stort hjärta, hårt arbete".Niklas Norrby, unless otherwise stated ISBN: 978-91-7519-372-4 ISSN: 0345-7524 Printed by LiU-Tryck, Linköping, Sweden, 2014 i Abstract A typical hard coating on metal cutting inserts used in for example turning, milling or drilling operations is TiAlN. At elevated temperatures, TiAlN exhibits a well characterized spinodal decomposition into coherent cubic TiN and AlN rich domains, which is followed by a transformation from cubic to hexagonal AlN. Using in-situ synchrotron x-ray radiation, the kinetics of the second transformation was investigated in this thesis and the strong temperature dependence on the transformation rate indicated a diffusion based nucleation and growth mechanism. The results gave additional information regarding activation energy of the transformation and the critical wavelength of the cubic domains at the onset of hexagonal AlN. After nucleation and growth, the hexagonal domains showed a striking resemblance with the preexisting cubic AlN microstructure.During metal cutting, the tool protecting coating is subjected to temperatures of ~900 ºC and pressure levels in the GPa range. The results in this thesis have shown a twofold effect of the pressure on the decomposition steps. Firstly, the spinodal decomposition was promoted by the applied pressure during metal cutting which was shown by comparisons with annealed samples at similar temperatures. Secondly, the detrimental transformation from cubic to hexagonal AlN was shown to be suppressed at elevated hydrostatic pressures. A theoretical pressure/temperature phase diagram, validated with experimental results, also showed suppression of hexagonal AlN by an increased temperature at elevated pressures.The spinodal decomposition during annealing and metal cutting was in this work also shown to be strongly affected by the elastic anisotropy of TiAlN, where the phase separation was aligned along the elastically softer <100> directions in the crystal. The presence of the anisotropic microstructure enhanced the mechanical properties compared to the isotropic case, mainly due to a shorter distance between the c-AlN and c-TiN domains in the anisotropic case. Further improvement of the metal cutting behavior ii was realized by depositing individual layers with an alternating bias. The individual bias layers exhibited microstructural differences with different residual stress states. The results of the metal cutting tests showed an enhanced wear resistance in terms of both crater and flank wear compared to coatings deposited with a fixed bias.iii Populärvetenskaplig sammanfattningI den här avhandlingen presenteras forskningsresultat på en keramisk beläggning, TiAlN (titanaluminiumnitrid), som ligger som ett skyddande skikt på svarvskär. Tjockleken på beläggni...

show abstract

Formation of (113) texture in fcc nitride thin films and its influence on the film properties

Cited by 8 publications

References 29 publications

Dynamic Evolution of Internal Stress, Grain Growth, and Crystallographic Texture in Arc-Evaporated Altin Thin Films Using In-Situ Synchrotron X-Ray Diffraction

Dynamic Evolution of Internal Stress, Grain Growth, and Crystallographic Texture in Arc-Evaporated Altin Thin Films Using In-Situ Synchrotron X-Ray Diffraction

Improved metal cutting performance with bias-modulated textured Ti0.50Al0.50N multilayers

Microstructural evolution of TiAlN hard coatings at elevated pressures and temperatures

Contact Info

Product

Resources

About