2005
DOI: 10.1016/j.nimb.2005.05.028
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Formation of almost delta-layered nanoparticles in SiO2 thin film on Si substrate by metal negative-ion implantation

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Cited by 11 publications
(10 citation statements)
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“…Irradiation of water and ethanol sprays with ultra-intense (5×10 19 W/cm 2 ), ultra short (45 fs) laser pulses has demonstrated the capability of this devices as a bright negative ion sources. The results are very exciting and different spray parameters could show further interesting features and reveal the full potential of this targetry approach.…”
Section: Discussionmentioning
confidence: 99%
See 1 more Smart Citation
“…Irradiation of water and ethanol sprays with ultra-intense (5×10 19 W/cm 2 ), ultra short (45 fs) laser pulses has demonstrated the capability of this devices as a bright negative ion sources. The results are very exciting and different spray parameters could show further interesting features and reveal the full potential of this targetry approach.…”
Section: Discussionmentioning
confidence: 99%
“…Negative ions could provide an excellent tool for material processing applications due to their "charge-up free" property in implantation processes. 18,19 Easy neutralization of an energetic beam of negative ions is exploited in accelerator technology, including injectors dedicated to heating of tokamak plasmas (e.g., the negative ion-based neutral beam injection (NBI) system in the International Thermonuclear Experimental Reactor (ITER)) and the next generation of particle accelerators such as European Spallation Source (ESS) and Spallation Neutron Source (SNS).…”
Section: Negative Ion Sourcementioning
confidence: 99%
“…(1) are practically zero. Consequently, the relative number of each species depends only on the relative cross-sections N qþ1 r qþ1;q À N q r q;qþ1 ¼ N q r q;qÀ1 À N qÀ1 r qÀ1;q : (2) Taking into account that in the experiments the higher carbon charge state measured was C 4þ one arrives at simple relations between the number of measured ions and the cross sections as follows:…”
Section: à3mentioning
confidence: 99%
“…The applications of negative ion beams range from use in surface growth and deposition processes to elucidating the details of chemical reactions under controlled collisions. In many upcoming structural processes, including implantation for micrometer-sized powder surface modification, 1 damage-free nanoparticle formation for quantum devices in a thin insulator film, 2 or the so-called bio-compatibility surface treatment in nerve cell engineering, 3,4 utilisation of negatively charged ions shows very promising results. The possibility of easy neutralization of negative ions is exploited in the accelerator technology, including injectors dedicated to heating of tokamak plasmas (e.g., the negative-ion-based Neutral Beam Injection (NBI) system in the International Thermonuclear Experimental Reactor (ITER) 5,6 ) and the next generation of particle accelerators such as spallation sources (ESS).…”
mentioning
confidence: 99%
“…Negative ions are used in many processing applications 7,8 and in accelerator technology, 9,10 including injectors for heating Tokamak plasmas. 11,12 A quantitative analysis of these particles is very important as their number, momentum, and temporal profile are closely related to the dynamics of the acceleration processes, and an enhanced understanding of these processes may allow controlling the beam properties as required by many foreseen applications.…”
Section: Introductionmentioning
confidence: 99%