2003
DOI: 10.1016/s0040-6090(03)00261-x
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Formation of an interfacial MoSe2 layer in CVD grown CuGaSe2 based thin film solar cells

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Cited by 66 publications
(33 citation statements)
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“…diffraction peak can be drawn. Finally, an additional diffraction peak, 103, emerging from the background can be assigned to the mixture of the two main MoSe 2 crystalline orientations, as it has been reported in the literature [48]. Structural surface sensitive analyses were also performed in this set of samples using Raman spectroscopy.…”
Section: Methodsmentioning
confidence: 71%
See 1 more Smart Citation
“…diffraction peak can be drawn. Finally, an additional diffraction peak, 103, emerging from the background can be assigned to the mixture of the two main MoSe 2 crystalline orientations, as it has been reported in the literature [48]. Structural surface sensitive analyses were also performed in this set of samples using Raman spectroscopy.…”
Section: Methodsmentioning
confidence: 71%
“…In this way, more light could be shed for instance on the specific location of the MoSe 2 layer with the c-axis growing perpendicular to the Mo surface, which usually is reported to be at the MoSe 2 /absorber interface [48]. Nevertheless, it has been also reported that a MoSe 2 layer could act as buffer layer between the Mo and the absorber, promoting an ohmic contact, and thereby improving the electrical transport.…”
Section: Methodsmentioning
confidence: 99%
“…[140][141][142][143] Wada et al 151 reported the formation of a MoSe 2 layer at the Mo/CIGS interface during the second stage of the three-stage process, yet only under (In,Ga)-rich growth and for substrate temperatures higher than 550 C. They found Na to enhance the formation of MoSe 2 (see also Section 6Á2). MoSe 2 layers were confirmed also in CuGaSe 2 -based solar cells by Würz et al 152 Contrary to the above results, Ballif et al 153 could not detect any intermediate compound within the Mo/CIGS interface.…”
Section: Sodium Incorporation In Cigsmentioning
confidence: 74%
“…Another, yet different approach for obtaining a clean surface in UHV is the preparation by peel-off [21,26]. In this technique, use is made of an intermediate van-der-Waals compound at the chalcopyrite/Mo [27] interface.…”
Section: Uhv-clean Surfacesmentioning
confidence: 99%