2017
DOI: 10.2351/1.4980163
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Formation of ArF laser-induced self-assembled macrostructures on poly methyl methacrylate and CR-39 polymers

Abstract: ArF excimer laser at λ = 193 nm induces the regular macrostructures on poly methyl methacrylate (PMMA) and CR-39 with the periodicity Λ under the proper UV doses. The periodic self-organizing pattern lucidly appears on the polymeric surface, creating the grooves parallel along with the direction of the focal line of the cylindrical lens. The spatial period Λ is enlarged in terms of the focal length f varying tens of microns, much larger than the laser wavelength (22–145 μm, Λ ≫ λ). The interspacing also alters… Show more

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Cited by 4 publications
(2 citation statements)
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“…ArF excimer laser at 193nm bene ts the following properties, i.e. 15 nsec duration and spatial distribution of ∼1 cm × 1 cm with transverse and vertical divergence of 1 and 3 mrad in orthogonal directions respectively [38][39][40][41] . Fig.…”
Section: Methodsmentioning
confidence: 99%
“…ArF excimer laser at 193nm bene ts the following properties, i.e. 15 nsec duration and spatial distribution of ∼1 cm × 1 cm with transverse and vertical divergence of 1 and 3 mrad in orthogonal directions respectively [38][39][40][41] . Fig.…”
Section: Methodsmentioning
confidence: 99%
“…The reflection of the microstructures is obtained using method C. Moreover, the creation of regular microstructures by the ArF excimer laser on the polymer surface of the solar cell attests to a decrease in spectral reflection alongside the flattening of the spectral reflection. This causes to enhance the efficiency of the solar cell by ~1% [15][16][17][18][19]. Moreover, the ZnO nanowires contribute to enhancing solar cell efficiencies due to UV-blue spectral downshifting [20,21].…”
Section: Introductionmentioning
confidence: 99%