“…Among physical vapor deposition (PVD) techniques, that have been modified to produce nanostructured materials, in particular thin films, pulsed laser deposition (PLD) in a buffer gas is a promising approach to deposit nanoparticles of different materials over wide intervals of process conditions (Wang et al, 2007;Wolowski et al, 2007;Gamaly et al, 2000). In exemplary PLD depositions, including Au/glass (Irissou et al, 2003), Au/HOPG (Zenkevich et al, 2002), Ag/Si (Seal et al, 2003), Pt/HOPG (Dolbec et al, 2004) on the nucleation and coalescence of NPs on the substrate was reported. The synthesis of C nanoclusters in plumes propagating through He and Ar atmospheres at pressures up to 1 kPa was reported and modeled (Bolgiaghi et al, 2005), keeping into account the relevant role of ionization phenomena occurring in the interface region between the shock wave front and the buffer gas (Bailini et al, 2006a(Bailini et al, , 2006b.…”