Harnessing cathodic hydrogen atom generation, metals such as Pt, Pd, Cu, Au and Ni are directly electrodeposited on functionalized dielectric layers of 6 nm thick silicon oxide formed by thermal oxidation of c-Si substrate. Modifying the oxide layer with functional molecules and Au nanoparticles by simple wet chemistry, we can enhance electrodeposition efficiently and thereby electroplate nanoparticles of Pd and Pt to obtain such thin metal films. In particular, Au nanoparticles on amine-modified silicon oxides remarkably enhance electrodeposition of metal nanoparticles to create sturdy metal films on the dielectric layer, n + -Si/SiO 2 -NH 2 . Such enhancement is ascribed to good affinity of Au nanoparticles with electrodeposited metal as well as enhanced current density across the silicon oxide. For an example of potential applications, we show one-step electrodeposition Pd film on dielectric layers to fabricate conductometric hydrogen gas sensor without transferring Pd film. 8 and so on. Electrochemical methods 9,10 allow the solution process under fine and easy control without reducing agents by directly delivering electrons to precursors. Importantly, it can create stabilizer-free NPs or films with pristine surfaces that potentially serve as catalytically active sites for sensors and chemical reactions.11 Therefore, electroplating method has been widely considered as a cost-effective alternative. Especially, electro-synthesis of nanoparticles on conducting surfaces 12,13 has been attracting steady attention as highlighted by shape-control of nanoparticles using the programmed electrochemical methods on glassy carbon electrode. 14 Despite its valuable merits, programmed electro-synthesis can produce nanoparticles on the conducting electrode, while need to be transferred to other substrates, mostly dielectric materials, for practical applications in many cases. Recently reported strategy gives an inspiration of direct electrodeposition on dielectric layer; Pd NPs deposited on n + -Si/thermal SiO 2 . 15 It appears to be counterintuitive to electroplate on insulating substrates but it works owing to electrogenerated hydrogen (H) atoms in the thermal SiO 2 layer. H atom-mediated electro-reduction on thermal SiO 2 layers can be finely controlled by not only the applied bias but also pH in the solution, producing pristine Pd NPs deposited without any stabilizer or additive. H atoms, which are created by reduction of protons migrating across thermal SiO 2 layers, are expected to make precursors reduced at the interface between SiO 2 and solution. Indeed, this suggests a new breakthrough toward direct electroplating technology for thin metal films on dielectric layer.There are a few critical issues to overcome. Low density of current carried by H atoms and poor affinity of metal onto pristine SiO 2 are likely to make the metal grow too slow to be a film. Furthermore, there is a limitation in uniformity of particles in terms of both size and shape. For fine and steady control of electroplating process, it is undesir...