2004
DOI: 10.1016/j.jallcom.2004.01.067
|View full text |Cite
|
Sign up to set email alerts
|

Formation of GaAs by annealing of two-layer Ga-As electrodeposits

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

1
3
0

Year Published

2006
2006
2024
2024

Publication Types

Select...
5
1

Relationship

0
6

Authors

Journals

citations
Cited by 7 publications
(4 citation statements)
references
References 19 publications
1
3
0
Order By: Relevance
“…Analogous annealing experiments analyzed with Raman yielded a similarly high critical annealing temperature (Supporting Information, Figure S6). The measured high threshold temperature necessary for metallurgical alloying of As(s) and Ga(l) into c-GaAs(s) is in accord with previous reports on purposely annealing As and Ga films , and suggest that the data in Figures and obtained far below 200 °C cannot be explained by a simple annealing effect.…”
Section: Resultssupporting
confidence: 90%
See 1 more Smart Citation
“…Analogous annealing experiments analyzed with Raman yielded a similarly high critical annealing temperature (Supporting Information, Figure S6). The measured high threshold temperature necessary for metallurgical alloying of As(s) and Ga(l) into c-GaAs(s) is in accord with previous reports on purposely annealing As and Ga films , and suggest that the data in Figures and obtained far below 200 °C cannot be explained by a simple annealing effect.…”
Section: Resultssupporting
confidence: 90%
“…The work presented here not only represents an explicit demonstration of an ec-LLS process for GaAs but also provides insight to rationalize the existing GaAs electrodeposition literature. Most reports indicate that coelectrodeposition of Ga and As from aqueous electrolytes cannot yield c-GaAs without subsequent annealing at high temperatures ( T ≥ 250 °C). , Typically, the net product at room temperature of coelectrodeposition of Ga and As is an amorphous, physical mixture of Ga and As. However, select reports do indicate some level of crystallinity in GaAs(s) from Ga and As coelectrodeposition at mild temperatures. ,, In coelectrodeposition, it is possible that microscopic Ga(l) droplets are formed initially that could then facilitate some type of ec-LLS process as described here.…”
Section: Discussionmentioning
confidence: 99%
“…Instead of codepositing Ga and As, sequential deposition of Ga and As layers in aqueous solutions has also been used at room temperature. , In these studies, Ga was deposited in 5 M KOH, and As was deposited in 7 M HCl sequentially. The as-deposited Ga–As bilayer films were annealed in a vacuum furnace at 80–190 °C or under N 2 atmosphere at 450 °C to obtain crystalline GaAs films.…”
Section: Electrochemical Synthesis Of Photocathodesmentioning
confidence: 99%
“…The obtained film was n-type semiconductor. Kozlov et al [79] synthesized GaAs films by heat treatment of individually deposited Ga and As layers. The single layers were electrodeposited from alkaline Ga and acidic As solutions.…”
Section: Gallium Arsenidementioning
confidence: 99%