2006
DOI: 10.1149/1.2357200
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Formation of HgCdTe by Electrochemical Atomic Layer Epitaxy (EC-ALE)

Abstract: Formation of Hg(1-x)CdxTe (MCT), thin films by electrochemical atomic layer epitaxy (EC-ALE) is reported. EC-ALE is the electrochemical analog of atomic layer epitaxy (ALE) and atomic layer deposition (ALD), and thus involves the growth of films an atomic layer at a time, using surface limited reactions. Underpotential deposition (UPD) is a type of electrochemical surface limited reaction, used in the present study for the formation of good quality MCT deposits using EC- ALE. The MCT films were formed … Show more

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Cited by 3 publications
(1 citation statement)
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“…The Stickney group has been working on the electrodeposition of semiconductors for the better of two decades, and has led the development of electrochemical of atomic layer deposition (E-ALD) [18][19][20][21][22][23][24][25] .…”
Section: Introductionmentioning
confidence: 99%
“…The Stickney group has been working on the electrodeposition of semiconductors for the better of two decades, and has led the development of electrochemical of atomic layer deposition (E-ALD) [18][19][20][21][22][23][24][25] .…”
Section: Introductionmentioning
confidence: 99%