2011
DOI: 10.1007/s10894-011-9435-y
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Formation of Nano-Crystalline Phase in Hydrogenated Amorphous Silicon Thin Film by Plasma Focus Ion Beam Irradiation

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Cited by 16 publications
(2 citation statements)
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“…Progress in such research has stimulated ion-beam emission studies in areas of material science, the ion-beam source motivating research applications in for instance surface modification [ 32 , 33 ], ion implantation [ 34 , 35 ], thin-film deposition [ 36 , 37 ], semiconductor doping [ 38 ], synthesis of nanoparticles [ 39 ], amorphization of silicon [ 40 ], Nanostructuring of FePt thin films [ 41 ] and formation of nanoparticle [ 42 ]. While many ion-beam measurement and diagnostic techniques have been developed, most particularly in seeking to characterize ion-beam emission, challenges continue to remain in clarifying the various emission complexities.…”
Section: Introductionmentioning
confidence: 99%
“…Progress in such research has stimulated ion-beam emission studies in areas of material science, the ion-beam source motivating research applications in for instance surface modification [ 32 , 33 ], ion implantation [ 34 , 35 ], thin-film deposition [ 36 , 37 ], semiconductor doping [ 38 ], synthesis of nanoparticles [ 39 ], amorphization of silicon [ 40 ], Nanostructuring of FePt thin films [ 41 ] and formation of nanoparticle [ 42 ]. While many ion-beam measurement and diagnostic techniques have been developed, most particularly in seeking to characterize ion-beam emission, challenges continue to remain in clarifying the various emission complexities.…”
Section: Introductionmentioning
confidence: 99%
“…The device is particularly interesting due to its special characteristic as intense pulsed sources of X-rays, ions, electrons and neutrons (deuterium filling) [2][3][4][5]. The early research was concentrated on the neutron emission [6,7] and yet in recent years, there is abrupt growth of researcher's interest in utilized plasma focus for its application in surface modification [8], ion implantation [9] and thin film deposition [10].…”
Section: Introductionmentioning
confidence: 99%