Formation of Nanotunnels Inside a Resist Film in Laser Interference Lithography

Wei, Qi; Hu, Fanhua; Wang, Liyuan

doi:10.1021/acs.langmuir.5b00194

Cited by 9 publications

(6 citation statements)

References 21 publications

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“…But what if the polymer does not have an easily protonizable functional group? The most prevalent type of positive tone photoresist consists of diazonaphthoquinone (DNQ), phenol formaldehyde polymer (Novolac), and propylene glycol monomethyl ether acetate (PGMEA) as the solvent [136][137][138][139]. In this way, at normal conditions, the dissolution of the polymer is blocked by the hydroxyl group of Novolac and DNQ interactions.…”

Section: The Described System Is Called the Amplification Resinsmentioning

confidence: 99%

Polymers for Regenerative Medicine Structures Made via Multiphoton 3D Lithography

Merkininkaitė

Gailevičius

Šakirzanovas

et al. 2019

International Journal of Polymer Science

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Multiphoton 3D lithography is becoming a tool of choice in a wide variety of fields. Regenerative medicine is one of them. Its true 3D structuring capabilities beyond diffraction can be exploited to produce structures with diverse functionality. Furthermore, these objects can be produced from unique materials allowing expanded performance. Here, we review current trends in this research area. We pay particular attention to the interplay between the technology and materials used. Thus, we extensively discuss undergoing light-matter interactions and peculiarities of setups needed to induce it. Then, we continue with the most popular resins, photoinitiators, and general material functionalization, with emphasis on their potential usage in regenerative medicine. Furthermore, we provide extensive discussion of current advances in the field as well as prospects showing how the correct choice of the polymer can play a vital role in the structure’s functionality. Overall, this review highlights the interplay between the structure’s architecture and material choice when trying to achieve the maximum result in the field of regenerative medicine.

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Section: The Described System Is Called the Amplification Resinsmentioning

confidence: 99%

Polymers for Regenerative Medicine Structures Made via Multiphoton 3D Lithography

Merkininkaitė

Gailevičius

Šakirzanovas

et al. 2019

International Journal of Polymer Science

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“…Nanochannels have been used for DNA analysis, virus detection, , water purification, protein research, , assessing molecule concentration, , particle separation, and environmental monitoring . The current fabrication methods use conventional lithography and include reactive ion etching, high-energy beam processing, and interference lithography . However, nanochannels fabricated using conventional lithography are not amenable to mass production; the high-energy beam process has relatively low production speed, and reactive ion etching and interference lithography have relatively smaller patternable areas.…”

Section: Introductionmentioning

confidence: 99%

“…10 The current fabrication methods use conventional lithography and include reactive ion etching, 11 high-energy beam processing, 12 and interference lithography. 13 However, nanochannels fabricated using conventional lithography are not amenable to mass production; the high-energy beam process has relatively low production speed, and reactive ion etching and interference lithography have relatively smaller patternable areas. Therefore, conventional lithography-based nanochannel fabrication systems are hard to scale up to mass production.…”

Section: ■ Introductionmentioning

confidence: 99%

Fabrication of a Novel Nanofluidic Device Featuring ZnO Nanochannels

Kim

Woo

et al. 2019

ACS Omega

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We developed a novel fabrication method for nanochannels that are easily scaled up to mass production by selectively growing zinc oxide (ZnO) nanostructures and covering using a flat PDMS surface to make hollow nanochannels. Nanochannels are used in the biotechnological and environmental fields, being employed for DNA analysis and water purification, due to their unique features of capillary-induced negative pressure and an electrical double-layer overlap. However, existing nanochannel fabrication methods are complicated, costly, and not amenable to mass production. Here, we developed a novel nanochannel fabrication method. The pillar-like dense ZnO nanostructures were grown in a solution process, which is easily applicable to mass production. The size of the fabricated ZnO nanostructures has a thickness of 30–300 nm and a diameter on the order of 102 nm, which are easily adjusted by synthesis times. The ZnO nanostructures were covered by the flat polydimethylsiloxane (PDMS) surface, and then the cracks between ZnO nanostructures served as hollow nanochannels. Because the suggested fabrication process has no thermal shrinkage, the process has higher production efficiency than existing nanochannel mass production methods based on the thermal/pressure process. The mechanical strength of the fabricated ZnO nanostructures was tested with repetitive tape peeling tests. Finally, we briefly verified the nanochannel performance by applying the nanochannel to the micro/nanofluidic system, whose performance is easily evaluated and visualized by current–voltage relation.

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“…Furthermore, the geometry and configuration of the nanostructures are subject to the attainable laser interference patterns, where the gain is limited to a single periodic pattern. In this regard, the stated drawbacks of employing EBL and LIL for the production of original stamps have driven researchers to seek superseding approaches [27][28][29][30][31][32][33][34][35][36][37][38][39][40][41]. As opposed to the former stamp origination methods, the NIL technique can prevail over the existing weak points, providing a promising future for industrialization of many technologies that are reliant upon nano-patterning.…”

Section: Introductionmentioning

confidence: 99%

“…Moreover, it is vital that the stamp can robustly generate the highest feasible number of replicas while maintaining the pattern fidelity. There have been many studies on the origination of nanoimprinting stamps from diverse materials including polymers and the aforementioned silicon and silicon dioxide [30,[42][43][44][45]. Among all, Ni stamps, due to their robustness and reliability, have proved to be able to unlock the potential of NIL technology for materializing the commercialization of nanoimprinting-based device manufacturing by enabling the proliferation of the possible number of replications from the same stamp [25,29].…”

Section: Introductionmentioning

confidence: 99%

Nickel stamp origination from generic SU-8 nanostructure arrays patterned with improved thermal development and reshaping

Abdolahi

Jiang²,

Patel³

et al. 2018

Nanotechnology

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In this study, we show that rapid, reliable, and scalable custom-input colour patterning and eye-readable data storage can be achieved through high-throughput nanoimprinting-exposure-thermal-treatment (NETT) and thermal development and reshaping (TDR) techniques. The main impediment for commercial realization of high-resolution metasurfaces using NETT and TDR is the cost and speed of stamp origination as well as the quality and durability of the fabricated stamp. In order to accelerate the patterning process, lower the fabrication costs, and obtain patterns with high-resolution, we introduce and optimize a new method for origination of durable Ni stamps by electroplating on an SU-8 master fabricated according to custom-input colour patterns via NETT and TDR. In these processes, laser exposure is used to locally activate the generic RGB pixels fabricated on SU-8 via thermal nanoimprint lithography (NIL), according to the custom design. Upon TDR treatment, the exposed regions crosslink while the unexposed areas flatten. TDR is optimized to find the fastest processing condition that results in minimum nanocone height reduction and maximum diffraction efficiency. AFM results show that the TDR-processed nanocones in all red, green, and blue subpixels witness minimal shrinkage in comparison with the corresponding as-imprinted RGB pixels. Among three different sets of direct baking and ramping temperature TDR experiments, direct 55 °C-10 min TDR is found to be the optimal recipe. As a proof-of-concept, the originated stamp was employed to replicate colour images on PET and glass substrates using UV-thermal NIL. The reproduced colour image, photographed at pre-defined lighting and viewing angles, bears vivid diffractive colours with different RGB ratios that are in good match with the custom-input image. Furthermore, the red, green, and blue diffraction peaks from the TDR-55 °C-baked sample exhibit either trivial or no distinguishable difference as compared to the corresponding peaks in the as-imprinted sample.

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Formation of Nanotunnels Inside a Resist Film in Laser Interference Lithography

Cited by 9 publications

References 21 publications

Polymers for Regenerative Medicine Structures Made via Multiphoton 3D Lithography

Polymers for Regenerative Medicine Structures Made via Multiphoton 3D Lithography

Fabrication of a Novel Nanofluidic Device Featuring ZnO Nanochannels

Nickel stamp origination from generic SU-8 nanostructure arrays patterned with improved thermal development and reshaping

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