1999
DOI: 10.1021/la991124w
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Formation of Self-Assembled Monolayers of Alkanethiols on GaAs Surface with in Situ Surface Activation by Ammonium Hydroxide

Abstract: The formation of self-assembled monolayers (SAMs) of alkanethiols on GaAs was studied using attenuated total reflection Fourier transform infrared spectroscopy. SAMs formed from an ethanol solution containing ammonium hydroxide were more ordered and stable than those obtained by the method previously reported in which surfaces were derivatized from neat molten alkanethiols at elevated temperatures. It is suggested that ammonium hydroxide etches the native surface oxide of GaAs during an initial step followed b… Show more

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Cited by 72 publications
(64 citation statements)
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“…For conventional electronics applications, TAM offers a potentially superior passivation for stabilizing completed devices or for preparing devices for regrowth after processing. For biosensor applications, the organic sulfide solutions closely match those reported for preparation of self-assembled monolayers on GaAs, 16 therefore, the TAM passivation can serve as a benchmark in the development of InAs-based biointerfaces. 4 One of the authors ͑D.Y.P.͒ thanks Dr. Jennifer C. Sullivan for help with the etching experiment.…”
Section: Performing Organization Name(s) and Address(es)mentioning
confidence: 75%
“…For conventional electronics applications, TAM offers a potentially superior passivation for stabilizing completed devices or for preparing devices for regrowth after processing. For biosensor applications, the organic sulfide solutions closely match those reported for preparation of self-assembled monolayers on GaAs, 16 therefore, the TAM passivation can serve as a benchmark in the development of InAs-based biointerfaces. 4 One of the authors ͑D.Y.P.͒ thanks Dr. Jennifer C. Sullivan for help with the etching experiment.…”
Section: Performing Organization Name(s) and Address(es)mentioning
confidence: 75%
“…The deposition procedure for SAMs on GaAs was based on prior work [12,[39][40][41]. Prior to deposition, wafers were cleaned with acetone for 10 min, followed by etching with 30% NH 4 OH for 1 min to remove the oxide.…”
Section: Sample Preparationmentioning
confidence: 99%
“…[12,16] However, whereas oxide regrowth is remarkably inhibited at the thiol/GaAs interface, [17] surface coverage is often incomplete, [16,18] and the monolayer films are gradually disrupted over the course of hours to days unless they are stored in an inert atmosphere. [15] To improve thiol binding to the GaAs surface, in-situ etching methods have been introduced to avoid oxide regrowth on freshly etched substrates, [19,20] which would otherwise occur immediately upon exposure to air. [21] It was recently suggested that ODT surfaces, assembled with a photochemical etching method, keep impedance spectra stable for several hours in an aqueous electrolyte solution under conditions of zero-current potential.…”
Section: Introductionmentioning
confidence: 99%