2013
DOI: 10.1109/tps.2013.2254501
|View full text |Cite
|
Sign up to set email alerts
|

Formation of Surface Alloys With a Low-Energy High-Current Electron Beam for Improving High-Voltage Hold-Off of Copper Electrodes

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

0
9
0
1

Year Published

2015
2015
2023
2023

Publication Types

Select...
9

Relationship

0
9

Authors

Journals

citations
Cited by 35 publications
(10 citation statements)
references
References 14 publications
0
9
0
1
Order By: Relevance
“…In this case the sharp interfacial boundary between the coat and the substrate is eroded and appears an extended transition layer (several micrometer thickness) with varying elemental composition, thereby achieving the highest level of adhesion of the coating to the substrate, which was previously demonstrated in many metallic systems coat-substrate [5].…”
Section: Methodology Of Researchmentioning
confidence: 81%
“…In this case the sharp interfacial boundary between the coat and the substrate is eroded and appears an extended transition layer (several micrometer thickness) with varying elemental composition, thereby achieving the highest level of adhesion of the coating to the substrate, which was previously demonstrated in many metallic systems coat-substrate [5].…”
Section: Methodology Of Researchmentioning
confidence: 81%
“…The unit enables deposition of films on the surface of the desired product and subsequent liquid-phase mixing of materials of the film and the substrate by an intense pulse electron beam [39,40]. The LEHCEB generation includes the emission of electrons, the formation of the beam in a plasma-filled diode, and the transportation thereof in a plasma channel [41,42]. The adoption of such generation scheme makes it possible to obtain a beam having a microsecond duration (about 5 ms) with a current density of 10 5 A/cm 2 , at an accelerating voltage of 15-30 kW [43].…”
Section: Methodsmentioning
confidence: 99%
“…The unit makes it possible to deposit films of various materials on the surface of an article with subsequent liquid-phase mixing of the materials of the film and of the substrate by an intense electron beam [13]. The manifested phase boundary between the film and the substrate is smeared yielding an extended transition layer with a thickness of several microns and variable composition of components [14].…”
Section: Methods Of Studymentioning
confidence: 99%