Formation of thin films using pulse power and electromagnetic repulsion forces

Abstract

Effect of arc suppression on the physical properties of low temperature dc magnetron sputtered tantalum thin films J.Co,Ni-base alloy thin films deposited by reactive radio frequency magnetron sputtering Nitrogen and oxygen transport and reactions during plasma nitridation of zirconium thin films Thin metal films that can strongly adhere to a plastic surface were formed from a metal plasma produced by applying pulse power. The associated electromagnetic repulsion force drives the metal plasma toward the plastic surface. In this paper, we present the properties of metal plasmas and thin metal films having strong adhesion to plastic surfaces.