2009
DOI: 10.1016/s1003-6326(08)60398-2
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Formation of unidirectional nanoporous structures in thickly anodized aluminum oxide layer

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Cited by 14 publications
(8 citation statements)
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“…In this study, the anodization process was developed by following Na et al's, 2009 anodization procedures (see Fig. 6(a)), where a sulfuric electrolyte solution composed of 20% Sulfuric Acid and 80% distilled water by weight was placed inside the test beaker followed by the two lead cathodes.…”
Section: Sample Preparationsmentioning
confidence: 99%
“…In this study, the anodization process was developed by following Na et al's, 2009 anodization procedures (see Fig. 6(a)), where a sulfuric electrolyte solution composed of 20% Sulfuric Acid and 80% distilled water by weight was placed inside the test beaker followed by the two lead cathodes.…”
Section: Sample Preparationsmentioning
confidence: 99%
“…However, near ambient temperatures (equal to or greater than 20 • C) significantly shorten the anodization time, allowing the synthesis of thick membranes in a short time, without the need for a cooling circuit [3]. Another way to minimize AAO film synthesis costs is to use commercial aluminum alloys such as AA 1050 (99.5% Al) [1,[16][17][18][19] as the substrate, although high-purity aluminum anodizing allows obtaining higher order films [11,15,20,21].…”
Section: Introductionmentioning
confidence: 99%
“…Moreover, the fraction of cracks increases significantly with anodizing time and electrolyte temperature. The crack-free oxide layers were obtained at the anodizing time of 2 h, irrespective of electrolyte temperature [46].…”
Section: Formation Of Defects and Cracks In The Oxide Structurementioning
confidence: 97%
“…On the other hand, too long exposition of the sample to the aggressive environment could result in damage of the aluminum substrate. [44][45][46] were applied for the fabrication of nanoporous alumina layers on the surface of low-purity Al substrates. A typical voltage versus time curve recorded during anodization under a constant current regime is shown in Fig.…”
Section: Al Substrate Pre-treatmentmentioning
confidence: 99%
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