Fourth-generation plasma immersion ion implantation and deposition facility for hybrid surface modification layer fabrication

Abstract

The fourth-generation plasma immersion ion implantation and deposition (PIIID) facility for hybrid and batch treatment was built in our laboratory recently. Comparing with our previous PIIID facilities, several novel designs are utilized. Two multicathode pulsed cathodic arc plasma sources are fixed on the chamber wall symmetrically, which can increase the steady working time from 6 h (the single cathode source in our previous facilities) to about 18 h. Meanwhile, the inner diameter of the pulsed cathodic arc plasma source is increased from the previous 80 to 209 mm, thus, large area metal plasma can be obtained by the source. Instead of the simple sample holder in our previous facility, a complex revolution-rotation sample holder composed of 24 shafts, which can rotate around its axis and adjust its position through revolving around the center axis of the vacuum chamber, is fixed in the center of the vacuum chamber. In addition, one magnetron sputtering source is set on the chamber wall instead of the top cover in the previous facility. Because of the above characteristic, the PIIID hybrid process involving ion implantation, vacuum arc, and magnetron sputtering deposition can be acquired without breaking vacuum. In addition, the PIIID batch treatment of cylinderlike components can be finished by installing these components on the rotating shafts on the sample holder.

Correlation between microstructure evolution and high temperature properties of TiAlSiN hard coatings with different Si and Al content

“…Fabrication of TiAlSiN coatings is carried out in a multi-purpose plasma immersion ion implantation and deposition facility [19]. A new metal plasma ion source equipped with four individual cathodes is designed, which can synchronously produce composite plasmas.…”

Review of titanium surface modification techniques and coatings for antibacterial applications

“…Obvious benefits are an enhanced integration both between the coating and the surface of interest and between tissues and the coating. [161] An early application of PIII&D to confer antibacterial activity to treated titanium surfaces was illustrated by Yoshinari et al [162] in 2001. They reported that Fion implantation significantly decreased bacterial growth of both P. gingivalis and A. actinomycetemcomitans (periodontopathic bacteria).…”

Electrochemical behavior of TiAlSiN hard coatings synthesized by a multi-plasma immersion ion implantation and deposition technique

“…TiAlSiN coatings were synthesized by using a plasma immersion ion implantation and deposition facility [28]. This facility has pulsed cathode arc and magnetron sputtering capabilities; therefore hybrid processes involving ion implantation, vacuum arc and sputtering deposition can be performed without breaking the vacuum.…”