Framework for integration of virtual metrology and predictive maintenance

Roeder, G.; Mattes, Andreas; Pfeffer, Markus; Schellenberger, Martin; Pfitzner, L.; Knapp, Alexander; Muhlberger, Heribert; Kyek, Andreas; Lenz, Benjamin; Frisch, Markus; Bichlmeier, Josef; Leditzky, Gunter; Lind, Erich; Zoia, Silvia; Fazio, Giuseppe

doi:10.1109/asmc.2012.6212913

Cited by 4 publications

(7 citation statements)

References 16 publications

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“…Metrology result validation data VM prediction validation data generic implementation of VM models in different fab environments and generated with different programming languages [1]. Additionally, in this work it was investigated whether the developed algorithms can also be implemented in the existing control framework of the IC manufacturer.…”

Section: Etch Depth (Nm)mentioning

confidence: 99%

“…"IMPROVE" addressed this challenge by several key developments: New algorithms for virtual metrology (VM), predictive maintenance (PdM), and advanced control planning (ACP) were developed together with solutions for their fab-wide integration. This assured that these new APC methods are reusable and may be implemented in existing fab systems of the IC manufacturers which widely differ in the automation infrastructure [1]. Virtual metrology is a novel control concept to predict post process metrology results (either measurable or non-measurable by physical metrology) using process and wafer state information that could include upstream metrology and sensor data [2,3].…”

Section: Introductionmentioning

confidence: 99%

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Virtual metrology for prediction of etch depth in a trench etch process

Roeder

Schellenberger

Pfitzner

et al. 2013

ASMC 2013 SEMI Advanced Semiconductor Manufacturing Conference

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In semiconductor manufacturing, advanced process control systems have become essential for cost effective manufacturing at high quality. Algorithms for new control methods such as virtual metrology where post process quality parameters are predicted from process and wafer state information need to be developed and implemented for critical process steps. The objectives of virtual metrology application are to support or replace stand-alone and in-line metrology operations, to support fault detection and classification, run-to-run control, and other new control entities such as predictive maintenance. As virtual metrology is typically based on statistical learning methods, a large variety of potential algorithms are available. The challenge of virtual metrology application is the capability to obtain precise predictions even in complex semiconductor manufacturing processes. In this paper, the approach and results towards the development of a virtual metrology algorithm for the prediction of trench depth after a complex dry-etch process are presented

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Section: Etch Depth (Nm)mentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Virtual metrology for prediction of etch depth in a trench etch process

Roeder

Schellenberger

Pfitzner

et al. 2013

ASMC 2013 SEMI Advanced Semiconductor Manufacturing Conference

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“…To account for the large process complexity in semiconductor fabrication, VM is typically based on statistical learning methods, although integration of different simulation applications including physicochemical and feature scale simulations are being developed [11]. In recent years, a variety of VM algorithms have been investigated for typical semiconductor fabrication processes [12]- [21] and even for transistor parameters [22], as have implementation solutions for VM [6], [23], [24]. However, still, the real challenge of applying VM is to achieve the capability to obtain precise predictions even in complex semiconductor manufacturing processes.…”

Section: A Concept Of Virtual Metrologymentioning

confidence: 99%

“…Within the project "IMPROVE", a framework for implementation of VM algorithms was developed, which enables a generic implementation of VM models in different fab environments, and generated with different programming languages [6]. Additionally, in this work it was investigated whether the developed algorithms can also be implemented in the existing control framework of the IC manufacturer.…”

Section: Implementation Aspectsmentioning

confidence: 99%

“…This challenge was addressed by several key developments in a joint effort at the European level with the objective to substantially enhance efficiency in European semiconductor manufacturing [1]. In this European joint effort, new algorithms for virtual metrology (VM), predictive maintenance (PdM) [2], and sampling strategies for advanced control planning [3]- [5] were developed, together with solutions for their fab-wide integration [6]. This assures that these new advanced process control (APC) methods are reusable and may be implemented in existing fab systems of IC manufacturers, which may widely differ in their automation infrastructure.…”

Section: Introductionmentioning

confidence: 99%

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Feasibility Evaluation of Virtual Metrology for the Example of a Trench Etch Process

Roeder

Winzer

Schellenberger

et al. 2014

IEEE Trans. Semicond. Manufact.

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In semiconductor manufacturing, the implementation of advanced process control systems has become essential for cost effective manufacturing at high product quality. In addition to established process control methods, new control techniques such as virtual metrology, where post-process quality parameters are predicted from process and wafer state information need to be developed and implemented for critical process steps. This requires a fab-wide approach due to the objectives of VM, which are to supplement or replace stand-alone and in-line metrology operations, to support fault detection and classification, run-torun control, or other new control entities such as predictive maintenance. Virtual metrology is typically based on statistical learning methods, and a large variety of potentially applicable algorithms are available. A key challenge of the virtual metrology application is proving its capability to produce precise predictions even in complex semiconductor manufacturing processes. In addition, virtual metrology applications need to be implementable into the specific automation and control environment already present in the respective fab. In this paper, the approach and results of a feasibility study toward the development and implementation of virtual metrology applications in a logic fab are presented. The feasibility study was performed for the prediction of trench depth after a complex dry etch process as the specific use case studied.Index Terms-Advanced process control, manufacturing data processing, stochastic gradient boosting, virtual metrology. Georg Roeder received the Diploma in material science and the Ph.D. degree in electrical engineering

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Virtual metrology as an approach for product quality estimation in Industry 4.0: a systematic review and integrative conceptual framework

Dreyfus

Psarommatis

May

et al. 2021

International Journal of Production Research

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Virtual metrology (VM) involves estimating a product's quality directly from production process data without physically measuring it. This enables the product quality of each unit of production to be monitored in real time, while preserving the process efficiency. Initially developed for the semiconductor industry, VM has recently been examined for use in other industrial fields. VM is enabled by components such as quality estimators and drift detectors. It enhances various industrial applications such as machine control and sampling decision systems. The literature lacks a comprehensive summary and a systematic review of the state of the art in VM. To fill this gap, this study followed a systematic methodology to conduct a complete and structured literature review of VM. This paper presents a detailed analysis of the 199 papers that we identified based on our search and selection criteria. Following our methodological framework, we assigned these papers to categories and highlighted shortcomings. Finally, we discussed VM's use in various industrial fields, underlining its potential for every manufacturing industry. This study and the proposed framework are useful for both practitioners and academicians since they raise crucial theoretical and managerial questions as well as provide suggestions for further research on this critical topic.

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Framework for integration of virtual metrology and predictive maintenance

Cited by 4 publications

References 16 publications

Virtual metrology for prediction of etch depth in a trench etch process

Virtual metrology for prediction of etch depth in a trench etch process

Feasibility Evaluation of Virtual Metrology for the Example of a Trench Etch Process

Virtual metrology as an approach for product quality estimation in Industry 4.0: a systematic review and integrative conceptual framework

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