1994
DOI: 10.1080/09500839408240982
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Free electrons and defects in microcrystalline silicon studied by electron spin resonance

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Cited by 62 publications
(26 citation statements)
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“…Originally, this line was ascribed to free electrons in the conduction band, since its zero-crossing g value is almost the same as that for conduction electrons in crystalline silicon. 1 In addition, for n-doped c-Si:H at low temperatures a resonance with the same g value as the LESR signal has been observed. 9,18 Finally, the same broadening in the line shape has been observed with increasing temperature as that found for conduction electrons in crystalline silicon.…”
Section: -13mentioning
confidence: 82%
See 1 more Smart Citation
“…Originally, this line was ascribed to free electrons in the conduction band, since its zero-crossing g value is almost the same as that for conduction electrons in crystalline silicon. 1 In addition, for n-doped c-Si:H at low temperatures a resonance with the same g value as the LESR signal has been observed. 9,18 Finally, the same broadening in the line shape has been observed with increasing temperature as that found for conduction electrons in crystalline silicon.…”
Section: -13mentioning
confidence: 82%
“…Systematic studies of the paramagnetic centers in c-Si:H were first presented in 1994. 1 Since the majority of the defects have g values near to that of free electrons, where g ϭ2.0023, a unique interpretation of the different centers is difficult and remains controversial. In this work, we provide additional interpretations for some of the ESR signals previously observed in c-Si:H.…”
Section: Introductionmentioning
confidence: 99%
“…The latter resonance is attributed to Si dangling-bond ͑DB͒ states. [5][6][7][8] The resonance at gϭ2.0043 cannot be unambiguously identified. From its resonance parameters it is probably related to dangling-bond states in Si-rich Si-O layers, 9,10 as a strong oxygen take up has been observed in secondary ion mass spectroscopy ͑SIMS͒ measurements on c-Si:H films, 11 and an increase of a signal at gϭ2.0044 in c-Si:H samples that were exposed to air for several weeks has been reported.…”
Section: Introductionmentioning
confidence: 99%
“…10,11 Several possibilities for the microscopic origin of the CE center have been discussed in literature: (a) free electrons in the conduction band (CE resonance), 10 (b) interface defects at the boundary of amorphous and crystalline phases, 15 (c) electrons confined to an inversion layer at the boundary of amorphous and crystalline phases of the material (Ref. 16) and (d) localized states due to internal twin grain boundaries inside of crystalline columns (Refs.…”
mentioning
confidence: 99%
“…[10][11][12][13] This renders electron paramagnetic resonance (EPR) the method of choice to unravel the microscopic defect structure and shed light on the influence of defect centers on charge-carrier transport mechanisms. In particular, hyperfine interactions (HFI) between the unpaired electron spin and nuclear spins in its vicinity constitute ultra sensitive probes of the defect wave function and the material composition in the vicinity of the defect.…”
mentioning
confidence: 99%