This chapter focuses mainly on the drain-extended MOS transistor, DEMOS, for high voltage applications, and on the lateral double-diffused MOS transistor, LDMOS, for high power applications. In both cases, the drain is extended with a lightly-doped region, referred to as the drift region, to sustain the high voltage. The chapter begins with an analysis of the drift region and its optimization, typically by reduced surface-field (RESURF) techniques. The transistor switching performance is then analyzed, followed by a discussion of DEMOS and LDMOS design considerations and characteristics. High-voltage and high-current effects are then described, including quasi-saturation, body current, on-state breakdown, and safe operating area (SOA). The chapter concludes with selected high-voltage device applications.
IntroductionThe MOSFETs discussed in Chap. 6 are designed for digital, analog, mixed-signal, and RF applications that operate in the low-to-medium voltage range of about 0.8-6 V. Many analog applications, however, require transistors that can handle voltages above 20 V and currents in the ampere range. Those transistors are referred to as high-voltage and power transistors. This chapter provides a comprehensive analysis of the drain-extended MOS transistor (DEMOS), for high-voltage and low-current applications, and the lateral double-diffused MOS (LDMOS) transistor, LDMOS, for power applications. (The "D" in LDMOS describes the sequential (double) diffusion of boron and arsenic through the same oxide opening, defining a precise channel length (Chap. 9). The "L" means that the current path is parallel to the silicon surface (lateral), as opposed to "V" in VDMOS where the current is nearly vertical to the silicon surface.) Schematic cross sections of both transistors (Table 7.1). The DEMOS is typically processed without added process complexity, whereas the LDMOS requires optimization of the P-body and N-drift regions to achieve high voltages and currents while minimizing the drain-to-source resistance and transistor area.The interest in bipolar, CMOS, and DMOS (BCD) technologies has been driven primarily by the proliferation of portable electronics, automotive electronics, and the need for energy efficiency. These applications cluster around different operating points, with 24 V for portable electronics; 60 V for automotive, solar, and LED backlighting; 85 V for power over Ethernet; 120 V for telecommunication; and 700 V for offline LED lighting, consumer, and industrial applications. As a result, BCD is now the technology of choice to realize power ICs by most integrated device manufacturers (IDM) and foundries [1][2][3][4][5].This chapter focuses mainly on transistors with voltage capabilities in the range of 20-700 V, where the bulk of the product applications lie.