Fresnel and far-field diffraction due to an elliptical aperture

Kathuria, Y.P.

doi:10.1364/josaa.2.000852

Cited by 17 publications

(17 citation statements)

References 11 publications

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“…4d). Substituting the measured divergence angles into Fraunhofer diffraction theory 26 confirmed the longest wavelength transmitted by each filter, together with its corresponding highharmonic order: 73 nm (H11) for the aluminium filter, 53 nm (H15) for the germanium filter, 38 nm (H21) for the Parylene filter and 18.6 nm (H43) for the zirconium filter.…”

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confidence: 79%

Plasmonic generation of ultrashort extreme-ultraviolet light pulses

et al. 2011

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Ultrashort extreme-ultraviolet pulses are a key tool in timeresolved spectroscopy for the investigation of electronic motion in atoms 1,2 , molecules 3 and solids 4 . High-harmonic generation is a well-established process for producing ultrashort extreme-ultraviolet pulses by direct frequency upconversion of femtosecond near-infrared pulses [5][6][7] . However, elaborate pump-probe experiments performed on the attosecond timescale 8,9 require continuous efforts to improve the spatiotemporal coherence and also the repetition rate of the generated pulses. Here, we demonstrate a three-dimensional metallic waveguide for the plasmonic generation of ultrashort extreme-ultraviolet pulses by means of field enhancement using surface-plasmon polaritons. The intensity enhancement factor reaches a peak of ∼350, allowing generation up to the 43rd harmonic in xenon gas, with a modest incident intensity of ∼1 3 10 11 W cm -2 . The pulse repetition rate is maintained as high as 75 MHz without external cavities. The plasmonic waveguide is fabricated on a cantilever microstructure and is therefore suitable for near-field spectroscopy with nanometre-scale lateral selectivity.Surface-plasmon polaritons (SPPs) are described as the electromagnetic wave propagating along a metal-dielectric interface that results from coupling between incident photons and surface plasmons 10,11 . In nanostructured tapered waveguides, SPPs can be controlled to adiabatically follow the geometric shape of the waveguide and asymptotically stop at the tip of the taper where the local crosssectional dimension becomes infinitesimally small 12,13 . As a result, SPPs can be focused beyond the diffraction limit in three dimensions on a sub-wavelength spot, with drastically enhanced optical intensity [12][13][14] . The effect of SPP adiabatic nanofocusing has been confirmed, studied and also tested for nanometre-scale microscopy in a series of earlier experiments [15][16][17][18][19] .In our investigation, this intriguing phenomenon of SPP adiabatic nanofocusing is used to generate ultrashort extreme ultraviolet (EUV) pulses directly from near-infrared (NIR) pulses. As depicted in Fig. 1, a three-dimensional waveguide was devised to concentrate the incident NIR pulses into a sub-wavelength spot, allowing highharmonic generation of EUV light pulses to take place with high spatiotemporal coherence. The waveguide is a metallic nanostructure made of silver and has a hollow hole that takes the shape of a tapered cone with its elliptical cross-section decreasing from the inlet aperture (minor-axis diameter, 2 mm) to the exit aperture (minor-axis diameter, 100 nm). The incident NIR pulses are focused on the inlet aperture at a repetition rate of 75 MHz with a moderate intensity of 1 × 10 11 W cm 22 . While each NIR pulse propagates through the tapered hole towards the exit aperture, the electric field intensity inside the hole undergoes a substantial boost that is sustained by the SPPs driven by the incident NIR pulse. Consequently, high-harmonic EUV pulses are generate...

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confidence: 79%

Plasmonic generation of ultrashort extreme-ultraviolet light pulses

et al. 2011

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“…(4) z a l l a According to (2), the aperture distribution UA (x li y 1 /s,0) in (1) varies slowly, whereas the exponential phase function undergoes many oscillations [11] . Therefore the integral (4) can be evaluated [12] and written in the form [1,2] Here the summation includes the contributions from all rectangular subdomains and…”

Section: Discussionmentioning

confidence: 99%

“…Recently we have investigated theoretically and experimentally the diffraction of a monochromatic light beam due to an uniformally illuminated elliptical aperture [1][2][3] . But the advent of the laser has greatly expanded the need to handle the nonuniform illumination of the aperture .…”

Section: Introductionmentioning

confidence: 99%

“…In view of these and many other applications [6,7], it is the object of the present investigation to extend our previous analysis to a case of non-uniform illumination of the elliptical aperture . Here we follow our previous analysis [1,2] and examine the most practically useful case, where the incident beam intensity at the aperture edge is reduced to e-2 of its central peak value . The incident elliptical Gaussian beam is characterized by the waist ratio e' =awy /wX , where cox and w r are its a-2 intensities along respectively the x 1 and 'y, directions in the aperture plane .…”

Section: Introductionmentioning

confidence: 99%

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Fresnel and Far-field Diffraction of a Truncated Elliptical Gaussian Beam Due to an Elliptical Aperture

Kathuria

1987

Journal of Modern Optics

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“…So many studies and researches were done from its first study in 1934 by F. Zernike [1], which it bears his name, who used it in testing spherical mirrors, and then by many researchers who extended their studies to apertures other than circular [2][3][4][5]. This research is interesting in the elliptical aperture, where the circular aperture tilted at some angle becomes an elliptical aperture, and for human eye, which is an optical system of wide field of view.…”

Section: Introductionmentioning

confidence: 99%

Study of Zernike Polynomials Properties for Oblique Elliptical Aperture at an Angle (? / 4) with X-Axis

2016

IJSR

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Abstract:In this research, some of the optical properties have been studied for oblique elliptical aperture at an angle (π / 4) with xaxis, by using Zernike polynomials. Zernike polynomials for circular aperture and Gram Schmidt orthogonalization method were adopted to find Zernike polynomials for the new aperture. And in this case the equations used are very complex, therefore, new coordinates m and n were used, that they were oblique at (π/ 4) to both x and y axes respectively. The relationship between Zernike polynomials for the new aperture with first and third order aberrations was derived. And it found that aberrations of high orders were balanced with aberrations of lower orders, for example, third order coma aberration were balanced with first order tilt error, while the third order spherical and astigmatism aberrations were balanced with focus aberration of first order. The standard deviation is also found in this research for balanced and unbalanced aberrations for any value of aspect ratio.

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Fresnel and far-field diffraction due to an elliptical aperture

Cited by 17 publications

References 11 publications

Plasmonic generation of ultrashort extreme-ultraviolet light pulses

Plasmonic generation of ultrashort extreme-ultraviolet light pulses

Fresnel and Far-field Diffraction of a Truncated Elliptical Gaussian Beam Due to an Elliptical Aperture

Study of Zernike Polynomials Properties for Oblique Elliptical Aperture at an Angle (? / 4) with X-Axis

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