Friction and Wear Properties of Graphite-Like Carbon Films Deposited on Different Substrates with a Different Interlayer Under High Hertzian Contact Stress

Wang, Yongjun; Li, Hongxuan; Liu, Xiaohong; Li, Ji; Wu, Yanxia; Lv, Yanhong; Fu, Yingying; Zhou, Hang; Chen, Jianmin

doi:10.1007/s11249-012-9943-6

Cited by 8 publications

(1 citation statement)

References 33 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Adhesion strength between the film and substrate is an important factor that affects the application of any thin films. 10 Higher adhesion strength often means longer wear life and better load bearing capacity of the films. The adhesion strength of the GLC films that deposited under different currents of ion source in our experiment is illustrated in Fig.…”

Section: Results and Analysismentioning

confidence: 99%

Structure and properties of GLC films deposited by PEMS

Yong¹,

Guo²,

Wang³

et al. 2016

Surface Engineering

View full text Add to dashboard Cite

In this paper, an unbalanced plasma enhanced magnetron sputtering system was adopted to deposit four types of the graphite-like carbon (GLC) films under different currents of ion source. The results show that a moderate Ar + bombardment effectively adjusts the content of sp 3 hybrid structure, and significantly improves the film's compactness. With the increase of ion source current, the hardness, H/E and H 3 /E 2 ratios of the film present a change rule of increasing first and decreasing subsequently, and all achieve their maximum values under the ion source current of 10 A. Moreover, the average values of the studied GLC films are all below 0.05 with slight fluctuation, while the wear rate of the film presents a significant difference with the increase of ion source current. Especially, when the ion source current is 10 A, the friction coefficient and the wear rate of the GLC films are 0.01 and 1.7 × 10 −16 m 3 N −1 m −1 , respectively, presenting excellent tribological properties.

show abstract

Section: Results and Analysismentioning

confidence: 99%