2017
DOI: 10.1016/j.vibspec.2016.12.004
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FTIR and Raman study of rapid thermal annealing and oxidation effects on structural properties of silicon-rich Si x C 1-x thin films deposited by R.F co-sputtering

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Cited by 7 publications
(5 citation statements)
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“…This fact suggests that other components are present on the catalyst surface. It has been reported in the literature that in this region, Si-O-Si and Mg-O stretching modes could appear [27][28]. Therefore, this could be a confirmation of our chemical interaction hypothesis: when the monolithic catalyst remains at high temperature (800°C) under reaction conditions for some time, the migration of cordierite components from the structure to the catalyst film starts to be relevant.…”
Section: Laser Raman Spectroscopy Resultssupporting
confidence: 87%
“…This fact suggests that other components are present on the catalyst surface. It has been reported in the literature that in this region, Si-O-Si and Mg-O stretching modes could appear [27][28]. Therefore, this could be a confirmation of our chemical interaction hypothesis: when the monolithic catalyst remains at high temperature (800°C) under reaction conditions for some time, the migration of cordierite components from the structure to the catalyst film starts to be relevant.…”
Section: Laser Raman Spectroscopy Resultssupporting
confidence: 87%
“…The last band centered around 1440 cm −1 is due to the C-C bonds. [14,27] Comparing the Raman spectra shown in Figs. 3(a…”
Section: Raman Characterizationmentioning
confidence: 99%
“…The spectra show two main overlapping peaks centered around 800 cm −1 and 1080 cm −1 , which are assigned to the stretching vibration mode of Si-C and Si-O bonds, respectively. [23,27] A little peak centered around 456 cm −1 is assigned to the rocking mode of Si-O bonds. [23,27] It is known that a SiC film is oxidized when the absorption peak of Si-O bonds appears in its FT-IR absorption spectrum.…”
Section: Ft-ir Characterizationmentioning
confidence: 99%
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“…The broad peak appearing at 631.46 cm −1 is due to the Si-H stretching vibration assigned to the substrate band (corresponding to silicon) [29] . The presence of O-H and Si-H bonds shows that the films are a little polluted by hydrogen, which may be the result of the water vapor absorbed during exposure to air (a few days) before analysis [30] .…”
Section: Spectroscopy Ft-ir Analysismentioning
confidence: 99%