1996
DOI: 10.1002/(sici)1096-9918(199601)24:1<1::aid-sia73>3.0.co;2-i
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FTIR and XPS Studies on Corrosion-resistant SiO2 Coatings as a Function of the Humidity during Deposition

Abstract: The degradation of SiO2 coatings deposited on alloys by metal organic chemical vapour deposition (MOCVD) in sulphidizing high‐temperature environments is determined by delamination and crack formation. With increasing water concentration during deposition, the crack density in silica decreases and the critical thickness for delamination of SiO2 coatings increases. This improvement is supposed to be caused by compositional changes in the SiO2 coating. In this study presence of water and silanol groups as measur… Show more

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Cited by 59 publications
(27 citation statements)
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“…Silicon signal appears on samples annealed at high temperatures (700 °C and above) and increases further with increase of annealing temperature. Si appears to be as SiO 2 , Si 2p photoelectron peak is located at 104.0 eV, shoulder in O 1s spectra was located at 532.8 eV (both typical for SiO 2 ). The amount of Si 4+ remains within a few percent as can be seen from Table .…”
Section: Resultsmentioning
confidence: 94%
“…Silicon signal appears on samples annealed at high temperatures (700 °C and above) and increases further with increase of annealing temperature. Si appears to be as SiO 2 , Si 2p photoelectron peak is located at 104.0 eV, shoulder in O 1s spectra was located at 532.8 eV (both typical for SiO 2 ). The amount of Si 4+ remains within a few percent as can be seen from Table .…”
Section: Resultsmentioning
confidence: 94%
“…For both the as-received and etched samples, the absence of a silanol (Si-OH) peak at 3670 cm −1 confirms the absence of a hydroxide terminate surface. 19 Both as-received and etched samples went through a vacuum drying process at 120 • C for 12 hours. This drying process causes condensation and dehydration of surface hydroxide, leading to the oxide-terminated surface.…”
Section: Resultsmentioning
confidence: 99%
“…The absolute silanol density will be decreased compared to the as-grown densities by a factor of 1.6 and 8 upon tempering at 800°C or 1000°C, respectively (Zhuravlev 2000). However, in the present case, the thermally grown SiO 2 is according to the amorphous fabrication procedure and thus subject to the formation of additional OH-bonds due to the presence of water (Hofman et al 1996) as applies under experimental conditions upon spin coating of the Ag particles. Even more importantly, diffusion will drastically depend on the inhomogeneous morphology of the silanol distribution (see Fig.…”
Section: Modification Of Silanol Densitymentioning
confidence: 70%