2005
DOI: 10.1016/j.optlaseng.2004.09.004
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Full field and microregion deformation measurement of thin films using electronic speckle pattern interferometry and array microindentation marker method

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Cited by 25 publications
(8 citation statements)
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“…Tel: 010-62794410; e-mail: lixide@ tsinghua.edu.cn et al, 2012). Especially, the development of ultrafine displacement or strain measurement techniques with spatial resolution down to the nanometre scale by combining the high-resolution electron microscope and image analysis methods, such as digital image correlation (DIC; Biery et al, 2003;Pan et al, 2009;Zhu et al, 2011), dark field electron holography (Li et al, 2005;Béché et al, 2013) micro-marker method (Li et al, 2005), and geometric phase analysis (Rösner et al, 2010), have caused great interest for many fields, for example, material science (Völkl et al, 1998;Rösner et al, 2010) and particularly the microelectronic industry Yaofeng et al, 2006;Auth et al, 2008). However, SEM imaging is a point wise procedure and exists undesirable scanning drift and magnetic lens distortion during focusing electron beam, which causes serious errors to precise imaging and deformation measurements.…”
Section: Introductionmentioning
confidence: 99%
“…Tel: 010-62794410; e-mail: lixide@ tsinghua.edu.cn et al, 2012). Especially, the development of ultrafine displacement or strain measurement techniques with spatial resolution down to the nanometre scale by combining the high-resolution electron microscope and image analysis methods, such as digital image correlation (DIC; Biery et al, 2003;Pan et al, 2009;Zhu et al, 2011), dark field electron holography (Li et al, 2005;Béché et al, 2013) micro-marker method (Li et al, 2005), and geometric phase analysis (Rösner et al, 2010), have caused great interest for many fields, for example, material science (Völkl et al, 1998;Rösner et al, 2010) and particularly the microelectronic industry Yaofeng et al, 2006;Auth et al, 2008). However, SEM imaging is a point wise procedure and exists undesirable scanning drift and magnetic lens distortion during focusing electron beam, which causes serious errors to precise imaging and deformation measurements.…”
Section: Introductionmentioning
confidence: 99%
“…To detect the deformation of normal microsamples, markers (20)(21)(22)(23)(24) are widely used to calculate the displacement information. Markers may be dark paints that are sprayed to the microspecimen, (20,21) or array spots (22) of different shapes obtained by milling at the end of a microcantilever, or microarrays (23) indented into the surface of a thin film, or even gold lines (24) deposited on silicon specimens for strain measurement. Besides the high cost for fabricating local features with high precision on the specimens, there are two additional issues that arise in the utilization of the manually specialized "marker" method.…”
Section: Introductionmentioning
confidence: 99%
“…1 Cross-section of hierarchical structure in Palmetto wood previously obtained using optical microscopy [3] interferometric techniques like marker techniques [4,5] and digital image correlation [6]. Moire interferometry [7][8][9][10], holographic interferometry [11,12] and speckle interferometry [7,8,[13][14][15][16][17][18] have been employed extensively for nanoscale and microscale deformation measurements.…”
Section: Introductionmentioning
confidence: 99%