2005
DOI: 10.1063/1.2008366
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Fullerenelike arrangements in carbon nitride thin films grown by direct ion beam sputtering

Abstract: Carbon nitride ͑CN x ͒ thin films were grown by direct N 2 / Ar ion beam sputtering of a graphite target at moderate substrate temperatures ͑300-750 K͒. The resulting microstructure of the films was studied by high-resolution transmission electron microscopy. The images showed the presence of curved basal planes in fullerenelike arrangements. The achievement and evolution of these microstructural features are discussed in terms of nitrogen incorporation, film-forming flux, and ion bombardment effects, thus add… Show more

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Cited by 24 publications
(9 citation statements)
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“…1͑a͔͒, and the layer spacing is approximately 0.34 nm, which is in good agreement with the layer spacing of the graphite face ͑0002͒. These features are typical of FL arrangements, 10,15 and are more clearly observed at the edge of the film where an individual structure of concentric FL shells could be distinguished. As the pulse duty cycle increased to 50%, similar microstructure was observed in the films, but with the smaller ordering degree and the shortened ordering range ͓Fig.…”
supporting
confidence: 78%
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“…1͑a͔͒, and the layer spacing is approximately 0.34 nm, which is in good agreement with the layer spacing of the graphite face ͑0002͒. These features are typical of FL arrangements, 10,15 and are more clearly observed at the edge of the film where an individual structure of concentric FL shells could be distinguished. As the pulse duty cycle increased to 50%, similar microstructure was observed in the films, but with the smaller ordering degree and the shortened ordering range ͓Fig.…”
supporting
confidence: 78%
“…Until now, the nitrided or the nonhydrogenated carbon films with FL structures have been synthesized by different techniques. [5][6][7][8][9][10] Nevertheless, FL nanostructured hydrogenated carbon films were scarcely reported, [11][12][13] and the growth mechanism was not known.…”
mentioning
confidence: 99%
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“…Since in SAED scattering by several nanoclusters -situated in the selected area -is involved, we calculated the overall scattered intensity of several randomly oriented clusters. In this way, we ignore any texture in actual materials such as is commonly reported for FL-CNx [12]. Atomic coordinates of nanoclusters were generated using perfect crystal lattice coordinates.…”
Section: Models and Calculationmentioning
confidence: 99%
“…Therefore, the remarkable mechanical properties of the FL-CN x thin films are to a great extent a consequence of nitrogen incorporation in the carbon matrix, which can be optimized and controlled using different deposition techniques and by adjusting the deposition parameters [57,75,76,84].…”
Section: A Bit Of Historymentioning
confidence: 99%