2006
DOI: 10.1109/led.2006.879029
|View full text |Cite
|
Sign up to set email alerts
|

Fully elastic interconnects on nanopatterned elastomeric substrates

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4
1

Citation Types

0
37
0

Year Published

2009
2009
2019
2019

Publication Types

Select...
8
2

Relationship

0
10

Authors

Journals

citations
Cited by 45 publications
(37 citation statements)
references
References 7 publications
0
37
0
Order By: Relevance
“…As compared to the simplified models available in the literature 37,38 Eq. 1 was found to best fit the experimental data with a coefficient of determination (K 2 ) of 0.994.…”
Section: Stretchable Behavior Of Esd-deposited Ag Films On Low Modulumentioning
confidence: 99%
“…As compared to the simplified models available in the literature 37,38 Eq. 1 was found to best fit the experimental data with a coefficient of determination (K 2 ) of 0.994.…”
Section: Stretchable Behavior Of Esd-deposited Ag Films On Low Modulumentioning
confidence: 99%
“…In the last decade, a high number of technologies to realize conformable electronic systems have been developed by a number of research institutes [1][2][3][4][5][6][7][8]. A wide variety of different processes exists nowadays to realize such systems, where each technology has its own particular characteristics and targeted application fields.…”
Section: Introductionmentioning
confidence: 99%
“…Therefore it is critical that the strain in brittle device layers is reduced below the value at which cracking is initiated. Methods of reducing the strain experienced by device layers include preventing the propagation of cracks through the device layers through nano-patterning [7,8], reducing the strain in layers below the fracture limit of the material by patterning islands [9,10] or shifting the critical device layers closer to the neutral bending plane [11,12].…”
Section: Introductionmentioning
confidence: 99%