2022
DOI: 10.1021/acsaelm.1c01190
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Fully Integrated Photodetector Array Based on an Electrochemically Exfoliated, Atomically Thin MoS2 Film for Photoimaging

Abstract: Despite the widespread interest in MoS 2 -based photodetectors over the past few years, use of a high-performance photoimaging device remains a major challenge due to the low yield and poor quality of the MoS 2 film. In this paper, we demonstrate a simple method to fabricate a high-performance fully integrated photodetector array based on a large-area atomically thin MoS 2 film for photoimaging. Here, the film is constructed by spin-coating of the MoS 2 nanosheets, which are acquired via electrochemical interc… Show more

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Cited by 8 publications
(9 citation statements)
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“…However, it is hard to control the location and distribution of the MoS 2 nanosheets during the spin coating process, which seriously limits the application of the electrochemical exfoliated nanosheets. Different from the spin coating, [ 23 ] inkjet printing provides a more uniform deposition surface in small scope. As a typical additive manufacturing, inkjet printing demonstrates great promise in fabricating electronic devices.…”
Section: Introductionmentioning
confidence: 99%
“…However, it is hard to control the location and distribution of the MoS 2 nanosheets during the spin coating process, which seriously limits the application of the electrochemical exfoliated nanosheets. Different from the spin coating, [ 23 ] inkjet printing provides a more uniform deposition surface in small scope. As a typical additive manufacturing, inkjet printing demonstrates great promise in fabricating electronic devices.…”
Section: Introductionmentioning
confidence: 99%
“…Figure c presents the responsivity ( R ) and specific detectivity ( D *) as a function of light power density under 915 nm at 0 V. Here, R is defined as photocurrent generated from per unit incident power on the effective area and calculated by the following formula: , italicR = I p h P i n italicA d where I ph is the current under illumination ( I illu ) subtracts dark current ( I dark ), P in is incident power density and A d is effective area. D * represents the ability of the photodetector to detect weak light signals and can be obtained as D * = A d B normalN normalE normalP normalN normalE normalP = i n 2 R where A d , B , NEP, i n , and R are the effective area, noise bandwidth, noise equivalent power (NEP), total noise current, and responsivity of the photodetector.…”
Section: Resultsmentioning
confidence: 99%
“…Figure 3c presents the responsivity (R) and specific detectivity (D*) as a function of light power density under 915 nm at 0 V. Here, R is defined as photocurrent generated from per unit incident power on the effective area and calculated by the following formula: 48,49 where A d , B, NEP, i n , and R are the effective area, noise bandwidth, noise equivalent power (NEP), total noise current, and responsivity of the photodetector. The total noise current can be obtained from the frequency-dependent noise spectral density at 1 Hz bandwidth.…”
Section: Mos Tip Mosmentioning
confidence: 99%
“…After that, exfoliated MoS 2 flakes are mixed in a suitable solvent to create a spin-coatable solution which was then placed onto the substrate. The spin-coated film served as the active layer of the PD array, responsible for light absorption and electron-hole generation, allowing efficient light absorption and facilitated high photoresponsivity [109].…”
Section: Coating Techniquesmentioning
confidence: 99%