A new
series of ruthenocene complexes were prepared from RuCl3·xH2O and 6,6-dimethylfulvene
as potential precursors for thin-film deposition. The formation of
these complexes was the result of an unforeseen nucleophilic attack
of the solvent molecules (alcohols/amines) on the 6,6-dimethylfulvene
ligand during the reaction. Complexes [RuII(C5H4C(CH3)2OCH3)2] (1), [RuII(C5H4C(CH3)2OC2H5)2] (2), [RuII(C5H4C(CH3)2N(CH3)2)2] (3), and [RuII(C5H4C(CH3)2N(CH2CH3)2)2] (4) were isolated in pure form and characterized by
Fourier transform (FT) infrared and FT nuclear magnetic resonance
spectroscopy as well as elemental and thermogravimetric (TG) analyses.
Crystallographic studies of complexes 1–3 revealed a monomeric ruthenocene structure for all complexes
and showed that the deprotonated alkylalkoxide or dialkylamide of
the solvent molecule was attached to the exocyclic carbon of the fulvene
ligand. Although the complexes were formed as ruthenocenes instead
of the expected ruthenium fulvene complexes, they all displayed excellent
stabilities and thermal properties. In particular, complexes 3 and 4 emerged as the best compounds owing to
their clean TGA plot and excellent volatility, holding the potential
as precursors for thin-film deposition.