2013
DOI: 10.4028/www.scientific.net/kem.596.65
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Functional-Group-Retaining Polymerization of Hydroxyethyl Methacrylate by Atmospheric Pressure Non-Equilibrium Plasma

Abstract: In this study, functional-group-retaining polymerization of hydroxyethyl methacrylate (HEMA) was carried out by using an atmospheric pressure non-equilibrium Ar plasma jet. The polymeric films deposited under different conditions were characterized by Fourier transform infrared spectroscopy (FT-IR). The FT-IR spectra show that HEMA was polymerized (carbon-carbon double bond disappeared) and the main functional groups were successfully retained in the plasma-polymerization films. The plasma-polymerization mecha… Show more

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Cited by 4 publications
(6 citation statements)
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“…The atmospheric pressure low-temperature plasma reactor used was same as that previously reported [4][5] and is shown in Fig. 1.…”
Section: Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…The atmospheric pressure low-temperature plasma reactor used was same as that previously reported [4][5] and is shown in Fig. 1.…”
Section: Methodsmentioning
confidence: 99%
“…On the other hand, the plasma assisted processes have become commonly used methods for the deposition of polymer-like films. We have reported the polymerization of the methacrylic monomers such as methyl methacrylate (MMA), 2-hydroxyethyl methacrylate (HEMA), methacrylic acid (MAA) and butyl methacrylate (BMA) induced by non-equilibrium atmospheric pressure Ar plasma jet [3][4][5]. These monomers were successfully polymerized with retaining the functional groups of ester or acid.…”
Section: Introductionmentioning
confidence: 99%
“…Before feeding the mixture of gases into the hollow inner electrode, they were passed through a mixing device to have a uniform effect (quenching) of the gases on each other. N 2 could be added through the glass capillary inserted into the hollow inner electrode for the direct injection into the plasma discharge but it was not effective [5]. Electrical Measurements.…”
Section: Methodsmentioning
confidence: 99%
“…At atmospheric pressure, a low temperature (22 to 35°C) , non-equilibrium plasma discharge generating device (CAPPLAT) fed by a high-voltage pulsed power source had already been developed and used successfully for both chemical vapor deposition (CVD) and polymer surface treatment [5,[8][9][10][11]. That device had also been commercialized under the name of "CAPPLAT" by Cresur Corporation [6].…”
Section: Introductionmentioning
confidence: 99%
“…At atmospheric pressure, a low temperature (22 to 35°C), non-equilibrium plasma discharge generating device (CAPPLAT) fed by a high-voltage pulsed power source had already been developed and used successfully for both chemical vapor deposition (CVD) and polymer surface treatment [4][5][6][7][8]. That device has also been commercialized under the name of "CAPPLAT" by Cresur Corporation [9].…”
Section: Introductionmentioning
confidence: 99%