Functionalization of periodic mesoporous organosilica with ureidopropyl groups by a direct synthesis method

Wei, Qi; Liu, Li; Nie, Zuoren; Chen, Hui-Qiao; Wang, Yanli; Li, Qun-Yan; Zou, Jing-Xia

doi:10.1016/j.micromeso.2006.09.014

Cited by 11 publications

(4 citation statements)

References 31 publications

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“…In the sol-gel coating spectrum, the NH, CH 2 and CH 3 stretching vibrations at 3348 and 2960 and 2840 cm −1 cannot be detected in the coated sample due to the broad band centered at 3370 cm −1 , which corresponds to νOH of alcohol or adsorbed water. These results are in agreement with ureido grafted on silica [ 21 ] or periodic mesoporous organosilica [ 22 ], as already reported.…”

Section: Resultssupporting

confidence: 92%

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Improvement of Adhesion Properties and Corrosion Resistance of Sol-Gel Coating on Zinc

Savignac¹,

Gressier

et al. 2018

Molecules

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Corrosion is a major problem for durability of many metals and alloys. Among the efficient classical surface treatments, chromate-based treatments must be banished from industrial use due to their toxicity. At the same time, sol-gel routes have demonstrated high potential to develop an efficient barrier effect against aggressive environments. By this process, the anti-corrosion property can be also associated to others in the case of the development of multi-functional hybrid coatings. In this paper, the main goal is precisely to improve both the corrosion resistance and the adhesion properties of phosphated zinc substrates by the deposition of a hybrid (organic-inorganic) sol-gel layer. To reach this double objective, a choice between two formulations 3-glycidoxypropyltrimethoxysilane (GPTMS)/aluminum-tri-sec-butoxide (ASB) and 3-(trimethoxysilyl)propylmethacrylate (MAP)/tetraethylorthosilicate (TEOS) was firstly made based on the results obtained by microstructural characterizations using SEM, optical analysis, and mechanical characterization such as shock and/or scratch tests (coupled to climatic chamber and salt spray exposure). Several investigations were performed in this study, and the best formulation and performances of the system were obtained by adding a new precursor (1-[3-(trimethoxysilyl)propyl]ureido-UPS) under controlled conditions, as detailed in this paper.

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Section: Resultssupporting

confidence: 92%

“…As seen in the literature [ 21 , 22 ], UPS precursor is a good adhesion promoter due to the functional group (NH-CO-NH 2 ). UPS is a hybrid precursor (organic-inorganic groups), and during the sol-gel network formation, covalent bonds are created, improving adhesion properties.…”

Section: Resultsmentioning

confidence: 99%

Improvement of Adhesion Properties and Corrosion Resistance of Sol-Gel Coating on Zinc

Savignac¹,

Gressier

et al. 2018

Molecules

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“…Different types of immobilisation of metal complexes were performed through a coordination bond with functional groups on the mesoporous supports. There have been dramatic developments in the studies on surface functionalisation of mesoporous materials [2][3][4][5]. For the functionalisation, aliphatic hydrocarbon [6], phenyl [7], amine [8] and vinyl, benzyl, phenyl, cyano, mercapto, aminopropyl or dihydroimidazole [9] ligands have been mainly studied as surface functional groups.…”

Section: Introductionmentioning

confidence: 99%

Effect of thiol-functionalised silica oncisplatin adsorption

Juan¹,

Brizuela²,

Simonetti³

2012

Molecular Simulation

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This study contributes to the investigation related to guest-host interactions between the chemotherapeutic agent cisplatin and a functionalised silica matrix in order to improve and find new materials such as drug carriers. The adsorption of cisplatin and its complexes, cis-[PtCl(NH 3 ) 2 ] þ and cis-[Pt(NH 3 ) 2 ] 2þ , on a SH-functionalised SiO 2 (111) surface has been studied by the atom superposition and electron delocalisation method. The adiabatic energy curves for the adsorption of the drug and its products on the delivery system were considered. The electronic structure and bonding analysis were also performed. The molecule and their complex are adsorbed on the functionalised surface resulting in a major absorption of the cis-[Pt(NH 3 ) 2 ] 2þ complex. The molecule -surface interactions are formed via ZSH group. The molecule/complexes SH electron-donating effect plays an important role in the catalytic reaction. The more important drug -carrier interactions occur through the ClZH bond for the adsorption of cis-[PtCl 2 (NH 3 ) 2 ] and cis-[PtCl(NH 3 ) 2 ] þ , and through the PtZS and PtZH interactions for cis-[Pt(NH 3 ) 2 ] 2þ adsorption. When the new interactions are formed, the functionalised carrier maintains their matrix properties while the molecule is the most affected after adsorption. The Pt atomic orbitals present the most important changes during adsorption.

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“…The surface properties of SiO 2 layers can be affected by configuring siloxane layers with aminosilanes. ,− The performance of the siloxane layer is related to the properties of the amino groups. ,,, Among various aminosilanes, the ureido group contains two amines directly bonded to a carbonyl, with oxygen and nitrogen capable of donating lone-pair electrons. Such a structure enables it to possess a high number of hydrogen-bonding sites, facilitating the stable presence in the hot-concentrated PA solution and accessible adjacency to the silica surface for the ureidosilane. − This characteristic makes the ureidosilanes more attractive than other aminosilanes for silica surface silanization. Thus, ureidosilanes show the potential to inhibit the SiO 2 etching by forming siloxane layers on the surface to prohibit the etchant from be accessed.…”

Section: Introductionmentioning

confidence: 99%

Study on the SiO₂ Wet-Etching Mechanism Using γ-Ureidopropyltriethoxysilane as an Inhibitor for 3D NAND Fabrication

Zhou,

Han,

et al. 2024

ACS Appl. Electron. Mater.

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The SiO 2 layers, as the dielectric in the multistack storage cells of 3D NAND, are detrimentally dissolved by phosphoric acid (PA) during the selective Si 3 N 4 etching. The thinning of SiO 2 layers leads to the failure of subsequent processes; thus, an etching inhibitor for SiO 2 is crucial for 3D NAND fabrication. However, most inhibitors are currently limited to neutral or alkaline solutions. In this work, the γ-ureidopropyltriethoxysilane (UPTES), compatible with a hot-concentrated PA solution, was applied to the wet-etching process for the first time and exhibited an inhibitory effect on SiO 2 etching by retarding the etch rate over 60% without affecting the Si 3 N 4 etching. The saturation adsorption of UPTES on the SiO 2 substrate is confirmed to occur around the critical concentration, according to the Langmuir−Freundlich adsorption isotherm. The adsorption behavior of UPTES exhibits a reliance on its concentration. Around the critical concentration, the UPTES molecules chemisorb on the SiO 2 surface by Si−O−Si covalent bonds to form ordered UPTESsiloxane layers, avoiding contact between SiO 2 and the etchant; whereas oversaturated UPTES polymers physisorb not only on SiO 2 but also on Si 3 N 4 , impeding the Si 3 N 4 etching. This work contributes to a step forward in the effective wet-etching process in highdensity 3D NAND fabrication.

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Functionalization of periodic mesoporous organosilica with ureidopropyl groups by a direct synthesis method

Cited by 11 publications

References 31 publications

Improvement of Adhesion Properties and Corrosion Resistance of Sol-Gel Coating on Zinc

Improvement of Adhesion Properties and Corrosion Resistance of Sol-Gel Coating on Zinc

Effect of thiol-functionalised silica oncisplatin adsorption

Study on the SiO₂ Wet-Etching Mechanism Using γ-Ureidopropyltriethoxysilane as an Inhibitor for 3D NAND Fabrication

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Functionalization of periodic mesoporous organosilica with ureidopropyl groups by a direct synthesis method

Cited by 11 publications

References 31 publications

Improvement of Adhesion Properties and Corrosion Resistance of Sol-Gel Coating on Zinc

Improvement of Adhesion Properties and Corrosion Resistance of Sol-Gel Coating on Zinc

Effect of thiol-functionalised silica oncisplatin adsorption

Study on the SiO2 Wet-Etching Mechanism Using γ-Ureidopropyltriethoxysilane as an Inhibitor for 3D NAND Fabrication

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Study on the SiO₂ Wet-Etching Mechanism Using γ-Ureidopropyltriethoxysilane as an Inhibitor for 3D NAND Fabrication