Functionalization of TiO2 sol-gel derived films for cell confinement

Pasquardini, Laura; Roncador, Alessandro; Prusakova, Valentina; Vanzetti, L.; Potrich, Cristina; Lunelli, Lorenzo; Pederzolli, Cecilia; Iannotta, Salvatore; Macchi, Paolo; Dirè, Sandra

doi:10.1016/j.colsurfb.2021.111787

Cited by 4 publications

(1 citation statement)

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“…In order to achieve the growth of high-quality TiO2 thin films, research groups have developed a wide variety of deposition methods such as chemical spray pyrolysis [10], sol-gel route [11], chemical vapor deposition process [12], electron-beam evaporation [13], co-precipitation and hydrothermal methods [14], atomic layer deposition [15], pulsed laser deposition [16], ion implantation [17] and direct current (DC) and radio frequency (RF) magnetron sputtering [18,19]. It should be noted that the most important deposition technique in terms of strong stability of the process, high deposition rate, very good thickness uniformity and low substrate temperatures is the RF magnetron sputtering technique; it produces dense and high quality TiO2 thin films with wellcontrolled stoichiometry and high adhesion over a wide range of different types of substrates.…”

Section: Introductionmentioning

confidence: 99%

Radio Frequency Magnetron Sputtering Growth of Titanium Dioxide Thin Films: Effects of Substrate Temperature on Microstructural and Optical Properties

Doghmane

Challali

Touam

et al. 2021

JNanoR

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Titanium dioxide thin films were deposited by radio frequency sputtering on glass substrates at different substrate temperatures. Hence, we first optimized the preparation conditions and parameters which offer better control and reproducibility of film fabrication. Then, we investigate the structural, morphological and optical properties of the prepared titanium dioxide thin films. To do so, we used several characterization techniques: X-ray diffraction, Raman spectroscopy, scanning electron microscopy, atomic force microscopy and ultraviolet-visible spectroscopy. Interesting results were obtained, e.g. X-ray diffraction analysis shows that the films crystallize only in the anatase tetragonal structure with a preferential orientation along the (101) plane. The intensity of the (101) diffraction peak and the crystallite size are found to increase with increasing substrate temperature, indicating a crystallinity improvement of the films. Raman peaks observed around 144, 197, 399, 515 and 639 cm−1 conﬁrm that all samples possess anatase phase and the crystallinity is enhanced with increasing substrate temperatures. The analysis of scanning electron microscopy and atomic force microscopy images demonstrates that increasing the substrate temperature significantly affects the morphology, grain size and surface roughness of TiO2 films. The ultraviolet-visible spectroscopy analysis put into evidence that the ﬁlm deposited at RT is highly transparent in the visible region with average transmittance greater than 84%. Higher substrate temperatures result in a slight decrease of transmittance. Moreover, the direct optical band gap decreases while the refractive index increases with increasing the substrate temperature. Thus, the obtained results reveal that ultraviolet-visible can be considered as a potential material for optical and photovoltaic applications.

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